Display device

ABSTRACT

A display device that can reduce power consumption is provided. The display device can include a substrate provided with a first subpixel and a second subpixel, a first electrode provided on the substrate, a first light emitting layer provided on the first electrode and emitting light of a first color, a second electrode provided on the first light emitting layer, a second light emitting layer provided on the second electrode and emitting light of a second color, and a third electrode provided on the second light emitting layer. The second electrode is disconnected between the first subpixel and the second subpixel, and the second electrode of the first subpixel is electrically connected with the third electrode.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority to Korean Patent Application No.10-2018-0157349 filed on Dec. 7, 2018 in the Republic of Korea, andKorean Patent Application No. 10-2018-0157292 filed on Dec. 7, 2018 inthe Republic of Korea, the entire contents of all these applications arehereby incorporated by reference into the present application.

BACKGROUND Technical Field

The present disclosure relates to a display device displaying an image.

Description of the Related Art

With the advancement of the information age, a demand for a displaydevice for displaying an image has increased with various forms.Therefore, various types of display devices such as a liquid crystaldisplay (LCD) device, a plasma display panel (PDP), and an organic lightemitting display (OLED) device have been recently used.

Recently, a head mounted display (HMD) that includes such a displaydevice has been developed. The head mounted display (HMD) is a glassestype monitor device of virtual reality (VR) or augmented reality (AR),which forms a focal point on a close distance in front of eyes of a userwho wears the HMD in glasses or helmet type.

The head mounted display has a difficulty in accurately forming andpatterning a light emitting layer of different colors for each ofsubpixels due to a compact pixel interval of high resolution. To addressthis, the head mounted display forms a white light emitting layer of aplurality of stacks emitting light of different colors as a commonlayer, and a color filter can be arranged per subpixel to embodydifferent colors. In this case, the head mounted display has anadvantage in that it is not required to accurately manufacture a mask orperform an accurate mask alignment process but has a problem in thatpower consumption is increased due to the plurality of stacks.

BRIEF SUMMARY

The present disclosure has been made in view of the above problems andother limitations associated with the related art, and it is an objectof the present disclosure to provide a display device that can reducepower consumption.

In accordance with an aspect of the present disclosure, the above andother objects can be accomplished by the provision of a display devicecomprising a substrate provided with a first subpixel and a secondsubpixel, a first electrode provided on the substrate, a first lightemitting layer provided on the first electrode, emitting light of afirst color, a second electrode provided on the first light emittinglayer, a second light emitting layer provided on the second electrode,emitting light of a second color, and a third electrode provided on thesecond light emitting layer. The second electrode is disconnectedbetween the first subpixel and the second subpixel, and the secondelectrode of the first subpixel is electrically connected with the thirdelectrode.

According to the present disclosure, the first light emitting layer andthe second light emitting layer are formed on the entire surface in thesubpixels without a mask, whereby the problem according to the case thatthe light emitting layers different per subpixel are formed to bepatterned using a mask can be solved. That is, the present disclosuredoes not require an accurate mask manufacturing process and or anaccurate mask alignment process, and is applicable to a display deviceof high resolution having a compact pixel interval.

Also, in the present disclosure, although the first light emitting layerand the second light emitting layer are formed on the entire surface,any one of the first light emitting layer and the second light emittinglayer can emit light in each of the subpixels. Therefore, in the presentdisclosure, power consumption can remarkably be reduced as compared withthe case that all of the first and second light emitting layers emitlight.

Also, in the present disclosure, the second electrodes are disconnectedamong the subpixels using the mask pattern, and the second electrode ofeach of the subpixels can be connected to any one of a first power line,a second power line and a second connection electrode. In the presentdisclosure, a separate mask is not required, and the mask pattern isformed simultaneously with the first electrode, whereby a separateprocess is not required additionally.

Also, in the present disclosure, the first electrode is not formed insome of the subpixels. Therefore, transmittance in the subpixel wherethe first electrode is not formed can be improved. Particularly, if thedisplay device is provided in a bottom emission type, since lightemitted from the light emitting layer may not pass through the firstelectrode, light efficiency can be improved.

Also, in the present disclosure, a bank is not formed in some of thesubpixels. Therefore, the subpixel where the bank is not formed can havea large light emitting area, and an opening ratio can be maximized.

In addition to the effects of the present disclosure as mentioned above,additional objects and features of the present disclosure will beclearly understood by those skilled in the art from the followingdescription of the present disclosure.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other objects, features and other advantages of thepresent disclosure will be more clearly understood from the followingdetailed description taken in conjunction with the accompanyingdrawings, in which:

FIG. 1 is a perspective view illustrating a display device according toone embodiment of the present disclosure;

FIG. 2 is a plane view illustrating a first substrate, a source driveIC, a flexible film, a circuit board, and a timing controller of FIG. 1;

FIG. 3 is a plane view briefly illustrating a first substrate accordingto the first embodiment of the present disclosure;

FIG. 4 is a cross-sectional view illustrating an example taken alongline I-I of FIG. 3;

FIG. 5 is a cross-sectional view illustrating an example taken alongline II-II of FIG. 3;

FIG. 6 is a plane view briefly illustrating an example of a firstsubpixel and a second subpixel;

FIG. 7 is a plane view illustrating a modified example of FIG. 6;

FIG. 8 is a plane view briefly illustrating an example of a thirdsubpixel;

FIG. 9 is a plane view illustrating a modified example of FIG. 8;

FIG. 10 is an enlarged view illustrating an example of an area A of FIG.4;

FIG. 11 is a cross-sectional view illustrating an example taken alongline III-III of FIG. 3;

FIG. 12 is a cross-sectional view illustrating an example taken alongline IV-IV of FIG. 3;

FIG. 13 is a plane view briefly illustrating a first substrate accordingto the second embodiment of the present disclosure;

FIG. 14 is a cross-sectional view illustrating an example taken alongline V-V of FIG. 13;

FIG. 15 is a plane view briefly illustrating an example of a firstsubpixel and a second subpixel;

FIG. 16 is a plane view briefly illustrating a first substrate accordingto the third embodiment of the present disclosure;

FIG. 17 is a cross-sectional view illustrating an example taken alongline VI-VI of FIG. 16;

FIG. 18 is a cross-sectional view illustrating an example taken alongline VII-VII of FIG. 16;

FIG. 19 is a plane view briefly illustrating an example of a firstsubpixel and a second subpixel;

FIG. 20 is a plane view illustrating a modified example of FIG. 19;

FIG. 21 is a plane view briefly illustrating an example of a thirdsubpixel;

FIG. 22 is an enlarged view illustrating an example of an area B of FIG.17;

FIG. 23 is a cross-sectional view illustrating an example taken alongline VIII-VIII of FIG. 16;

FIG. 24 is a cross-sectional view illustrating an example taken alongline IX-IX of FIG. 16;

FIG. 25 is a plane view illustrating a modified example of FIG. 17;

FIG. 26 is a plane view illustrating another modified example of FIG.17;

FIG. 27 is a plane view briefly illustrating a first substrate of adisplay panel according to the fourth embodiment of the presentdisclosure;

FIG. 28 is a cross-sectional view illustrating an example taken alongline X-X of FIG. 27;

FIG. 29 is a plane view briefly illustrating an example of a firstsubpixel and a second subpixel;

FIG. 30 is a flow chart illustrating a method for manufacturing adisplay device according to the first embodiment of the presentdisclosure;

FIGS. 31A to 31J are cross-sectional views illustrating a method formanufacturing a display device according to the first embodiment of thepresent disclosure;

FIG. 32 is a flow chart illustrating a method for manufacturing adisplay device according to the third embodiment of the presentdisclosure;

FIGS. 33A to 33J are cross-sectional views illustrating a method formanufacturing a display device according to the third embodiment of thepresent disclosure; and

FIGS. 34A to 34C are views illustrating a display device according toanother embodiment of the present disclosure, and relate to ahead-mounted display (HMD) device.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Advantages and features of the present disclosure, and implementationmethods thereof will be clarified through following embodimentsdescribed with reference to the accompanying drawings. The presentdisclosure may, however, be embodied in different forms and should notbe construed as limited to the embodiments set forth herein. Rather,these embodiments are provided so that this disclosure will be thoroughand complete, and will fully convey the scope of the present disclosureto those skilled in the art. Further, the present disclosure is onlydefined by scopes of claims.

A shape, a size, a ratio, an angle, and a number disclosed in thedrawings for describing embodiments of the present disclosure are merelyan example, and thus, the present disclosure is not limited to theillustrated details. Like reference numerals refer to like elementsthroughout the specification. In the following description, when thedetailed description of the relevant known function or configuration isdetermined to unnecessarily obscure the important point of the presentdisclosure, the detailed description will be omitted.

In a case where ‘comprise’, ‘have’, and ‘include’ described in thepresent specification are used, another part can be added unless ‘only-’is used. The terms of a singular form can include plural forms unlessreferred to the contrary.

In construing an element, the element is construed as including an errorrange although there is no explicit description.

In describing a position relationship, for example, when the positionrelationship is described as ‘upon-’, ‘above-’, ‘below-’, and ‘nextto-’, one or more portions can be arranged between two other portionsunless ‘just’ or ‘direct’ is used.

In describing a temporal relationship, for example, when the temporalorder is described as “after,” “subsequent,” “next,” and “before,” acase which is not continuous can be included, unless “just” or “direct”is used.

It will be understood that, although the terms “first”, “second”, etc.can be used herein to describe various elements, these elements shouldnot be limited by these terms. These terms are only used to partitionone element from another. For example, a first element could be termed asecond element, and, similarly, a second element could be termed a firstelement, without departing from the scope of the present disclosure.

Here, “X-axis direction”, “Y-axis direction” and “Z-axis direction”should not be construed by a geometric relation only of a mutualvertical relation, and can have broader directionality within the rangethat elements of the present disclosure can act functionally.

The term “at least one” should be understood as including any and allcombinations of one or more of the associated listed items. For example,the meaning of “at least one of a first item, a second item, and a thirditem” denotes the combination of all items proposed from two or more ofthe first item, the second item, and the third item as well as the firstitem, the second item, or the third item.

Features of various embodiments of the present disclosure can bepartially or overall coupled to or combined with each other, and can bevariously inter-operated with each other and driven technically as thoseskilled in the art can sufficiently understand. The embodiments of thepresent disclosure can be carried out independently from each other, orcan be carried out together in co-dependent relationship.

Hereinafter, the preferred embodiments of the display device accordingto the present disclosure will be described in detail with reference tothe accompanying drawings.

FIG. 1 is a perspective view illustrating a display device according toone embodiment of the present disclosure. FIG. 2 is a plane viewillustrating a first substrate, a source drive IC, a flexible film, acircuit board, and a timing controller of FIG. 1. All the components ofthe display device according to all embodiments of the presentdisclosure are operatively coupled and configured.

Referring to FIGS. 1 and 2, a display device 100 according to oneembodiment of the present disclosure includes a display panel 110, asource drive integrated circuit (source drive IC) 140, a flexible film150, a circuit board 160, and a timing controller 170.

The display panel 110 includes a first substrate 111 and a secondsubstrate 112. The second substrate 112 can be an encapsulationsubstrate. The first substrate 111 can be a plastic film, a glasssubstrate, or a silicon wafer substrate formed using a semiconductorprocess. The second substrate 112 can be a plastic film, a glasssubstrate, or an encapsulation film.

A plurality of gate lines, a plurality of data lines, and a plurality ofsubpixels are formed on one surface of the first substrate 111 facingthe second substrate 112. The subpixels are provided in a plurality ofareas defined by an intersection structure of the gate lines and thedate lines.

Each of the subpixels can include a light emitting diode that includes atransistor, an anode electrode, a light emitting layer, and a cathodeelectrode. Each of the subpixels supplies a predetermined current to thelight emitting diode in accordance with a data voltage of the data lineif a gate signal from the gate line is s input thereto using thetransistor. For this reason, a high potential voltage can be applied tothe anode electrode, and a low potential voltage can be applied to thecathode electrode, whereby the light emitting layer of each of thesubpixels can emit light at predetermined brightness in accordance withthe predetermined current.

The display panel 110 can be divided into a display area DA wheresubpixels are formed to display an image, and a non-display area NDAthat does not display an image. The gate lines, the data lines, and thepixels can be formed in the display area DA. A gate driver and pads canbe formed in the non-display area NDA.

The gate driver sequentially supplies gate signals to the gate lines inaccordance with to a gate control signal input from the timingcontroller 170. The gate driver can be formed in the non-display areaNDA outside one side or both sides of the display area DA of the displaypanel 110 in a gate driver-in-panel (GIP) type. Alternatively, the gatedriver can be manufactured as a driving chip, can be packaged in aflexible film, and can be attached to the non-display area NDA outsideone side or both sides of the display area DA of the display panel 110in a tape automated bonding (TAB) type.

The source drive IC 140 receives digital video data and a source controlsignal from the timing controller 170. The source driver IC 140 convertsthe digital video data into analog data voltages in accordance with thesource control signal, and supplies the analog data voltages to the datalines. If the source drive IC 140 is manufactured as a driving chip, thesource drive IC 140 can be packaged in the flexible film 150 in achip-on-film (COF) type or a chip-on-plastic (COP) type.

A plurality of pads, such as data pads, can be formed in the non-displayarea NDA of the display panel 110. Lines connecting the pads with thesource drive IC 140 and lines connecting the pads with lines of thecircuit board 160 can be formed in the flexible film 150. The flexiblefilm 150 can be attached onto the pads using an anisotropic conductivefilm, whereby the pads can be connected with the lines of the flexiblefilm 150.

The circuit board 160 can be attached onto the flexible films 150. Aplurality of circuits embodied as driving chips can be packaged in thecircuit board 160. For example, the timing controller 170 can bepackaged in the circuit board 160. The circuit board 160 can be aprinted circuit board (PCB) or a flexible printed circuit board (FPCB).

The timing controller 170 receives the digital video data and a timingsignal from an external system board through a cable of the circuitboard 160. The timing controller 170 generates a gate control signal forcontrolling an operation timing of the gate driver and a source controlsignal for controlling the source drive ICs 140 based on the timingsignal. The timing controller 170 supplies the gate control signal tothe gate driver, and supplies the source control signal to the sourcedrive ICs 140.

First Embodiment

FIG. 3 is a plane view briefly illustrating a first substrate accordingto the first embodiment of the present disclosure, FIG. 4 is across-sectional view illustrating an example taken along line I-I ofFIG. 3, FIG. 5 is a cross-sectional view illustrating an example takenalong line II-II of FIG. 3, FIG. 6 is a plane view briefly illustratingan example of a first subpixel and a second subpixel, FIG. 7 is a planeview illustrating a modified example of FIG. 6, FIG. 8 is a plane viewbriefly illustrating an example of a third subpixel, FIG. 9 is a planeview illustrating a modified example of FIG. 8, FIG. 10 is an enlargedview illustrating an example of an area A of FIG. 4, FIG. 11 is across-sectional view illustrating an example taken along line III-III ofFIG. 3, and FIG. 12 is a cross-sectional view illustrating an exampletaken along line IV-IV of FIG. 3.

Referring to FIGS. 3 to 12, the display panel 110 according to the firstembodiment of the present disclosure comprises a first substrate 111, alight-shielding layer 210, a first insulating film 220, a drivingtransistor 230, first connection electrodes 241, 242 and 360, a secondconnection electrode 250, a second insulating film 260, a planarizationfilm 270, mask patterns 281, 282 and 283, first electrodes 311, 312 and313, a bank 315, first light emitting layers 321, 322 and 323, secondelectrodes 331, 332 and 333, a second light emitting layer 340, and athird electrode 350.

The first substrate 111 can be made of, but not limited to, glass orplastic. The first substrate 111 can be made of a semiconductor materialsuch as silicon wafer. The first substrate 111 can be made of atransparent material or an opaque material.

The first substrate 111 is categorized into a display area DA and anon-display area NDA. A first subpixel P1, a second subpixel P2 and athird subpixel P3 can be provided on the display area DA of the firstsubstrate 111. The first subpixel P1 can be provided to emit red light,the second subpixel P2 can be provided to emit green light, and thethird subpixel P3 can be provided to emit blue light. However, thesesubpixels are not limited to this case. A fourth subpixel can further beprovided on the display area DA of the substrate 111 to emit white (W)light. Also, an arrangement sequence of the subpixels P1, P2 and P3 canbe changed in various ways.

The display device according to the first embodiment of the presentdisclosure can be provided in, but not limited to, a bottom emissiontype in which light is emitted downwardly. If the display deviceaccording to the first embodiment of the present disclosure is providedin a bottom emission type, a transparent material can be used as thefirst substrate 111. On the other hand, if the display device accordingto the first embodiment of the present disclosure is provided in a topemission type in which light is emitted upwardly, not only a transparentmaterial but also an opaque material can be used as the first substrate111.

A circuit diode which includes various signal lines, a drivingtransistor and a capacitor is provided on the first substrate 111 foreach of the subpixels P1, P2 and P3. The signal lines can include a gateline, a data line, a power line, and a reference line.

The driving transistor 230 supplies a predetermined voltage to the firstelectrodes 311, 312 and 313 in accordance with the data voltage of thedata line if the gate signal is input to the gate line. The drivingtransistor 230 includes an active layer, a gate electrode, a sourceelectrode, and a drain electrode.

An active layer is provided on the first substrate 111. The active layercan be formed of a silicon based semiconductor material or an oxidebased semiconductor material. A light-shielding layer 210 for shieldingexternal light entering the active layer can be provided between thefirst substrate 111 and the active layer, as shown in FIG. 4. If thelight-shielding layer 210 is formed of a metal material, a firstinsulating film 220 can be provided between the active layer and thelight-shielding layer 210.

A gate insulating film can be provided on the active layer. The gateinsulating film can be formed of an inorganic film, for example, asilicon oxide film, a silicon nitride film or a multi-layered film ofthe silicon oxide film and the silicon nitride film.

The gate electrode can be provided on the gate insulating film. The gateelectrode can be formed of a single layer or multi-layer comprised ofany one of Mo, Al, Cr, Au, Ti, Ni, Nd and Cu or their alloy.

An inter-layer dielectric film can be provided on the gate electrode.The inter-layer dielectric film can be formed of an inorganic film, forexample, a silicon oxide film, a silicon nitride film, or amulti-layered film of the silicon oxide film and the silicon nitridefilm.

The source electrode and the drain electrode can be provided on theinter-layer dielectric film. Each of the source electrode and the drainelectrode can be connected to the active layer through a contact holethat passes through the gate insulating film and the inter-layerdielectric film. Each of the source electrode and the drain electrodecan be formed of, but not limited to, a single layer or multi-layercomprised of any one of Mo, Al, Cr, Au, Ti, Ni, Nd and Cu or theiralloy.

The first connection electrodes 241, 242 and 360 and the secondconnection electrode 250 are provided on the first substrate 111.

The first connection electrodes 241, 242 and 360 electrically connectthe second electrodes 331 and 332 and the third electrode 350 of thefirst subpixel P1 and the second subpixel P2 with each other. In moredetail, the first connection electrodes 241, 242 and 360 can include afirst power line 241, a second power line 242 and an auxiliary powerline 360.

The auxiliary power line 360 is provided to be extended from thenon-display area NDA to a first direction (e.g., X-axis direction). Theauxiliary power line 360, as shown in FIGS. 11 and 12, can partially beexposed without being covered by the first insulating film 220, thesecond insulating film 260 and the planarization film 270, and can beconnected with the third electrode 350 at the exposed area.

The auxiliary power line 360 can be formed of, but not limited to, thesame material as that of the light-shielding layer 210 on the same layeras the light-shielding layer 210. The auxiliary power line 360 can beformed of the same material as that of any one of the active layer, thegate electrode, the source electrode and the drain electrode on the samelayer as that of any one of them.

The first power line 241 is arranged at one side of the first subpixelP1 in the display area DA and then connected with the second electrode331 of the first subpixel P1. Although the first power line 241 isarranged between the first subpixel P1 and the third subpixel P3 inFIGS. 4 to 7, the first power line 241 is not limited to the example ofFIGS. 4 to 7. The first power line 241 can be arranged between the firstsubpixel P1 and the second subpixel P2.

The first power line 241 can be provided to be extended from the displayarea DA to a second direction (e.g., Y-axis direction). The plurality offirst subpixels P1 can be arranged along the second direction inparallel with the first power line 241. In this case, the first powerline 241 can be connected with the second electrode 331 of all of thefirst subpixels P1 arranged in parallel, or can be connected with thesecond electrode 331 of some of the first subpixels P1.

Meanwhile, the plurality of first subpixels P1 can be arranged along thesecond direction alternately with the plurality of second subpixels P2.In this case, the first power line 241 can be connected to the secondelectrode 331 of all of the plurality of first subpixels P1, or can beconnected to the second electrode 331 of some of the plurality of firstsubpixels P1. Alternatively, the first power line 241 can be connectedto the second electrodes 331 and 332 of all of the plurality of firstsubpixels P1 and the plurality of second subpixels P2, or can beconnected to the second electrodes 331 and 332 of some of the pluralityof first subpixels P1 and the plurality of second subpixels P2.

One end of the first power line 241 is connected to the auxiliary powerline 360. The first power line 241 can be connected to, but not limitedto, the auxiliary power line 360 through a contact hole as shown in FIG.11.

The first power line 241 can be formed of the same material as that ofany one of the active layer, the gate electrode, the source electrodeand the drain electrode of the driving transistor 230 on the same layeras any one of them.

In accordance with the aforementioned description, the second electrode331 and the third electrode 350 of the first subpixel P1 areelectrically connected with each other through the first power line 241and the auxiliary power line 360. That is, if a low potential voltage isapplied to the third electrode 350, the same low potential voltage asthe third electrode 350 is applied to the second electrode 331 of thefirst subpixel P1.

The second power line 242 is arranged at one side of the second subpixelP2 in the display area DA and then connected with the second electrode332 of the second subpixel P2. Although the second power line 242 isarranged between the first subpixel P1 and the second subpixel P2 inFIGS. 4 to 7, the second power line 242 is not limited to the example ofFIGS. 4 to 7. The second power line 242 can be arranged between thesecond subpixel P2 and the third subpixel P3.

The second power line 242 can be provided in the display area DA, andcan be extended to the second direction (Y-axis direction). Theplurality of second subpixels P2 can be arranged along the seconddirection in parallel with the second power line 242. In this case, thesecond power line 242 can be connected with the second electrode 332 ofall of the second subpixels P2 arranged in parallel, or can be connectedwith the second electrode 332 of some of the plurality of secondsubpixels P2.

Meanwhile, the plurality of second subpixels P2 can be arranged alongthe second direction alternately with the plurality of first subpixelsP1. In this case, the second power line 242 can be connected to thesecond electrode 332 of all of the plurality of second subpixels P2, orcan be connected to the second electrode 332 of some of the plurality ofsecond subpixels P2. Alternatively, the second power line 242 can beconnected to the second electrodes 331 and 332 of all of the pluralityof first subpixels P1 and the plurality of second subpixels P2, or canbe connected to the second electrodes 331 and 332 of some of theplurality of first subpixels P1 and the plurality of second subpixelsP2.

One end of the second power line 242 is connected to the auxiliary powerline 360. The second power line 242 can be connected to, but not limitedto, the auxiliary power line 360 through a contact hole as shown in FIG.11.

The second power line 242 can be formed of the same material as that ofany one of the active layer, the gate electrode, the source electrodeand the drain electrode of the driving transistor 230 on the same layeras any one of them.

In accordance with the aforementioned description, the second electrode332 and the third electrode 350 of the second subpixel P2 areelectrically connected with each other through the second power line 242and the auxiliary power line 360. That is, if a low potential voltage isapplied to the third electrode 350, the same low potential voltage asthe third electrode 350 is applied to the second electrode 332 of thesecond subpixel P2.

The second connection electrode 250 electrically connects the firstelectrode 313 of the third subpixel P3 with the second electrode 333 ofthe third subpixel P3.

The second connection electrode 250 is arranged at one side of the thirdsubpixel P3 in the display area DA and connected with the firstelectrode 313 of the third subpixel P3 and the second electrode 333 ofthe third subpixel P3.

Although FIGS. 4, 5 and 8 illustrate that the second connectionelectrode 250 is arranged between the second subpixel P2 and the thirdsubpixel P3, the second connection electrode 250 is not limited to theexamples of FIGS. 4, 5 and 8. The second connection electrode 250 can bearranged between the third subpixel P3 and the first subpixel P1.

Also, although FIGS. 4, 5 and 8 illustrate that the second connectionelectrode 250 is only arranged at one side of the third subpixel P3, thesecond connection electrode 250 is not limited to the examples of FIGS.4, 5 and 8. The second connection electrode 250 can be arranged at aplurality of sides of the third subpixel P3. For example, if the thirdsubpixel P3 includes four sides on a plane, the second connectionelectrode 250 can be arranged on all of the four sides of the thirdsubpixel P3 as shown in FIG. 9. That is, the second connection electrode250 can be arranged on at least one of the four sides of the thirdsubpixel P3.

The second connection electrode 250 can be patterned to correspond toeach of the plurality of third subpixels P3. At this time, the secondconnection electrodes 250 provided to correspond to each of theplurality of third subpixels P3 are spaced apart from each other so asnot to be electrically connected with each other as shown in FIG. 3. Onethird subpixel P3 can be connected with one second connection electrode251, and the other one third subpixel P3 can be connected with the otherone second connection electrode 252. At this time, one second connectionelectrode 251 and the other one second connection electrode 252 can bepatterned and spaced apart from each other so as not to be electricallyconnected with each other.

The second connection electrode 250 can be formed of the same materialas that of any one of the active layer, the gate electrode, the sourceelectrode and the drain electrode of the driving transistor 230 on thesame layer as any one of them.

In accordance with the aforementioned description, the first electrode313 and the second electrode 333 of the third subpixel P3 areelectrically connected with each other through the second connectionelectrode 250. That is, if a third high potential voltage is applied tothe first electrode 313 of the third subpixel P3, the same highpotential voltage as the first electrode 313 of the third subpixel P3 isapplied to the second electrode 333 of the third subpixel P3.

The second insulating film 260 is provided on the driving transistor230, the first connection electrodes 241, 242 and 360 and the secondconnection electrode 250 to protect the driving transistor 230. Thesecond insulating film 260 covers the driving transistor 230 and at thesame time partially exposes the first connection electrodes 241, 242 and360 and the second connection electrode 250.

In more detail, the second insulating film 260 includes opening areasOA1, OA2, OA3 and OA4 that partially expose the first connectionelectrodes 241, 242 and 360 and the second connection electrode 250.

The second insulating film 260 can include a first opening area OA1 forpartially exposing the first power line 241 as shown in FIGS. 4 and 5.The first opening area OA1 can be provided along the first power line241. At this time, the first opening area OA1 can be provided on onefirst power line 241 in one or a plurality of patterns having apredetermined length on one first power line 241 along the seconddirection (Y-axis direction).

Also, the second insulating film 260 can include a second opening areaOA2 for partially exposing the second power line 242 as shown in FIGS. 4and 5. The second opening area OA2 can be provided along the secondpower line 242. At this time, the second opening area OA2 can beprovided on one second power line 242 in one or a plurality of patternshaving a predetermined length along the second direction (Y-axisdirection).

Also, the second insulating film 260 can include a third opening areaOA3 for partially exposing the second connection electrode 250 as shownin FIGS. 4 and 5. The third opening area OA3 can be provided to surroundthe third subpixel P3. Therefore, the third opening area OA3 partiallyexposes the second connection electrode 250 in an area where the secondconnection electrode 250 is provided, and exposes the first insulatingfilm 220 in an area where the second connection electrode 250 is notprovided.

Also, the second insulating film 260 can include a fourth opening areaOA4 for partially exposing the auxiliary power line 360 as shown inFIGS. 11 and 12. The auxiliary power line 360 is partially exposed bythe first insulating film 220, and the fourth opening area OA4 can beprovided on the exposed auxiliary power line 360.

The second insulating film 260 can be formed of an inorganic film, forexample, a silicon oxide film, a silicon nitride film or a multi-layeredfilm of the silicon oxide film and the silicon nitride film.

The planarization film 270 is provided on the second insulating film 260to planarize a step difference due to the driving transistor 230. Atthis time, the planarization film 270 is not provided on the openingareas OA1, OA2, OA3 and OA4 of the second insulating film 260.Therefore, the first connection electrodes 241, 242 and 360 and thesecond connection electrode 250 can partially still be exposed.

The planarization film 270 can have a formation area smaller than thesecond insulating film 260. Therefore, the planarization film 270 canpartially expose the second insulating film 260. At this time, thesecond insulating film 260 can be exposed in an area adjacent to theopening areas OA1, OA2, OA3 and OA4 without being covered by theplanarization film 270.

The planarization film 270 can be formed of an organic film such asacrylic resin, epoxy resin, phenolic resin, polyamide resin, andpolyimide resin.

The first electrodes 311, 312 and 313 are provided to be patterned onthe planarization film 270 for each of the subpixels P1, P2 and P3. Onefirst electrode 311 is provided on the first subpixel P1, another firstelectrode 312 is provided on the second subpixel P2, and the other firstelectrode 313 is provided on the third subpixel P3.

The first electrodes 311, 312 and 313 are connected to the sourceelectrode or the drain electrode of the driving transistor 230 throughcontact holes CH1, CH2 and CH3 that pass through the second insulatingfilm 260 and the planarization film 270. The first electrode 311 of thefirst subpixel P1 is connected to the source electrode or the drainelectrode of the driving transistor 230 through the contact hole CH1,whereby a first high potential voltage is applied to the first electrode311 of the first subpixel P1. The first electrode 312 of the secondsubpixel P2 is connected to the source electrode or the drain electrodeof the driving transistor 230 through the contact hole CH2, whereby asecond high potential voltage is applied to the first electrode 312 ofthe second subpixel P2. The first electrode 313 of the third subpixel P3is connected to the source electrode or the drain electrode of thedriving transistor 230 through the contact hole CH3, whereby a thirdhigh potential voltage is applied to the first electrode 313 of thethird subpixel P3.

Meanwhile, the first electrode 313 of the third subpixel P3 is connectedto the second connection electrode 250 through a contact hole CH4 thatpasses through the second insulating film 260.

The first electrodes 311, 312 and 313 can be formed of a transparentmetal material, a semi-transmissive metal material, or a metal materialwith high reflexibility. If the display device 100 is formed in a bottomemission type, the first electrodes 311, 312 and 313 can be formed of atransparent conductive material (TCO) such as ITO and IZO, which cantransmit light, or a semi-transmissive conductive material such as Mg,Ag, or an alloy of Mg and Ag. If the display device 100 is formed in atop emission type, the first electrodes 311, 312 and 313 can be formedof a metal material with high reflexibility such as a depositedstructure (Ti/Al/Ti) of Al and Ti, a deposited structure (ITO/Al/ITO) ofAl and ITO, an Ag alloy, and a deposited structure (ITO/Ag alloy/ITO) ofAg alloy and ITO. The Ag alloy can be an alloy of Ag, Pd and Cu. Thefirst electrodes 311, 312 and 313 can be anode electrodes.

The mask patterns 281, 282 and 283 are provided on the second insulatingfilm 260 to partially cover the opening areas OA1, OA2 and OA3 of thesecond insulating film 260. The mask patterns 281, 282 and 283 include afirst mask pattern 281, a second mask pattern 282, and a third maskpattern 283.

The first mask pattern 281 includes a protrusion 281 a provided on thesecond insulating film 260 exposed without being covered by theplanarization film 270 and protruded to partially cover the firstopening area OA1 that partially exposes the first power line 241. Atthis time, the protrusion 281 a of the first mask pattern 281 is spacedapart from the first power line 241 to form a space with the first powerline 241.

The first mask pattern 281 is provided to be close to the subpixelarranged to adjoin the first subpixel P1 by interposing the firstopening area OA1. The first opening area OA1 for exposing the firstpower line 241 can be arranged, but not limited, between the firstsubpixel P1 and the third subpixel P3.

If the first opening area OA1 of the second insulating film 260 isarranged between the third subpixel P3 and the first subpixel P1, thefirst mask pattern 281 can be protruded such that the protrusion 281 ais headed for the first opening area OA1 from the third subpixel P3.Therefore, a partial area of the first opening area OA1, which isadjacent to the third subpixel P3, is covered by the first mask pattern281, and the first power line 241 is also covered by the first maskpattern 281. The other area of the first opening area OA1, which isadjacent to the first subpixel P1, still exposes the first power line241.

The first mask pattern 281 can be provided along the first power line241 in the same manner as the first opening area OA1. At this time, thefirst mask pattern 281 can be provided on one first power line 241 in aplurality of patterns having a predetermined length along a seconddirection (e.g., Y-axis direction) as shown in FIG. 6. However, thefirst mask pattern 281 is not limited to the example of FIG. 6. Thefirst mask pattern 281 can be provided on one first power line 241 inone line pattern extended in the second direction (Y-axis direction) asshown in FIG. 7.

Meanwhile, the first mask pattern 281 can be formed of, but not limitedto, the same material as that of the first electrodes 311, 312 and 313on the same layer as the first electrodes 311, 312 and 313.

As shown in FIGS. 4 and 5, the first mask pattern 281 can be formed ofthe same material as that of the first electrodes 311, 312 and 313 onthe same layer as the first electrodes 311, 312 and 313. At this time,the first mask pattern 281 can be spaced apart from the first electrodes311, 312 and 313.

If the first opening area OA1 of the second insulating film 260 isarranged between the third subpixel P3 and the first subpixel P1, thefirst mask pattern 281 is spaced apart from the first electrode 313 ofthe third subpixel P3 such that it is not electrically connected withthe first electrode 313 of the third subpixel P3. The first mask pattern281 can be provided on the planarization film 270 as well as the secondinsulating film 260 exposed without being covered by the planarizationfilm 270.

In this case, in the display device 100, the first mask pattern 281 isformed of the same material as that of the first electrodes 311, 312 and313 on the same layer as the first electrodes 311, 312 and 313. As aresult, the first mask pattern 261 is formed without adding a separateprocess.

However, without limitation to this case, the first mask pattern 281 canbe provided on a layer different from the first electrodes 311, 312 and313. The first mask pattern 281 can be provided between the secondinsulating film 260 and the planarization film 270.

The second mask pattern 282 includes a protrusion 282 a provided on thesecond insulating film 260 exposed without being covered by theplanarization film 270 and protruded to partially cover the secondopening area OA2 for partially exposing the second power line 242. Atthis time, the protrusion 282 a of the second mask pattern 282 is spacedapart from the second power line 242 to form a space with the secondpower line 242.

The second mask pattern 282 is provided to be close to the subpixelarranged to adjoin the second subpixel P2 by interposing the secondopening area OA2. The second opening area OA2 for exposing the secondpower line 242 can be arranged, but not limited, between the firstsubpixel P1 and the second subpixel P2.

If the second opening area OA2 of the second insulating film 260 isarranged between the first subpixel P1 and the second subpixel P2, thesecond mask pattern 282 can be protruded such that the protrusion 282 ais headed for the second opening area OA2 from the first subpixel P1.Therefore, a partial area of the second opening area OA2, which isadjacent to the first subpixel P1, is covered by the second mask pattern282, and the second power line 242 is also covered by the second maskpattern 282. The other area of the second opening area OA2, which isadjacent to the second subpixel P2, still exposes the second power line242.

The second mask pattern 282 can be provided along the second power line242 in the same manner as the second opening area OA2. At this time, thesecond mask pattern 282 can be provided on one second power line 242 ina plurality of patterns having a predetermined length along a seconddirection (Y-axis direction) as shown in FIG. 6. However, the secondmask pattern 282 is not limited to the example of FIG. 6. The secondmask pattern 282 can be provided on one second power line 242 in oneline pattern extended in the second direction (Y-axis direction) asshown in FIG. 7.

Meanwhile, the second mask pattern 282 can be formed of, but not limitedto, the same material as that of the first electrodes 311, 312 and 313on the same layer as the first electrodes 311, 312 and 313.

As shown in FIGS. 4 and 5, the second mask pattern 282 can be formed ofthe same material as that of the first electrodes 311, 312 and 313 onthe same layer as the first electrodes 311, 312 and 313. At this time,the second mask pattern 282 can be spaced apart from the firstelectrodes 311, 312 and 313.

If the second opening area OA2 of the second insulating film 260 isarranged between the first subpixel P1 and the second subpixel P2, thesecond mask pattern 282 is spaced apart from the first electrode 311 ofthe first subpixel P1 such that it is not electrically connected withthe first electrode 311 of the first subpixel P1. The second maskpattern 282 can be provided on the planarization film 270 as well as thesecond insulating film 260 exposed without being covered by theplanarization film 270.

In this case, in the display device 100, the second mask pattern 282 isformed of the same material as that of the first electrodes 311, 312 and313 on the same layer as the first electrodes 311, 312 and 313. As aresult, the second mask pattern 282 is formed without adding a separateprocess.

However, without limitation to this case, the second mask pattern 282can be provided on a layer different from the first electrodes 311, 312and 313. The second mask pattern 282 can be provided between the secondinsulating film 260 and the planarization film 270.

The third mask pattern 283 includes a protrusion 283 a provided on thesecond insulating film 260 exposed without being covered by theplanarization film 270 and protruded to partially cover the thirdopening area OA3 for partially exposing the second connection electrode250. At this time, the protrusion 283 a of the third mask pattern 283 isspaced apart from the second connection electrode 250 to form a spacewith the second connection electrode 250.

The third mask pattern 283 is provided to be close to the subpixelarranged to adjoin the third subpixel P3 by interposing the thirdopening area OA3. The third opening area OA3 for exposing the secondconnection electrode 250 mad be arranged, but not limited, between thefirst subpixel P1 and the third subpixel P3 and between the secondsubpixel P2 and the third subpixel P3.

If the third opening area OA3 of the second insulating film 260 isarranged between the first subpixel P1 and the third subpixel P3, thethird mask pattern 283 can be protruded such that the protrusion 283 ais headed for the third opening area OA3 from the first subpixel P1.Therefore, a partial area of the third opening area OA3, which isadjacent to the first subpixel P1, is covered by the third mask pattern283, and the second connection electrode 250 or the first insulatingfilm 220 is also covered by the third mask pattern 283. The other areaof the third opening area OA3, which is adjacent to the third subpixelP3, still exposes the second connection electrode 250 or the firstinsulating film 220.

Also, if the third opening area OA3 of the second insulating film 260 isarranged between the second subpixel P2 and the third subpixel P3, thethird mask pattern 283 can be protruded such that the protrusion 283 ais headed for the third opening area OA3 from the second subpixel P2.Therefore, a partial area of the third opening area OA3, which isadjacent to the second subpixel P2, is covered by the third mask pattern283, and the second connection electrode 250 or the first insulatingfilm 220 is also covered by the third mask pattern 283. The other areaof the third opening area OA3, which is adjacent to the third subpixelP3, still exposes the second connection electrode 250 or the firstinsulating film 220.

The third mask pattern 283 can be provided to surround the thirdsubpixel P3 in the same manner as the third opening area OA3 as shown inFIGS. 8 and 9. The second electrode 333 of the third subpixel P3 can bedisconnected from the second electrode 331 of the first subpixel P1 andthe second electrode 332 of the second subpixel P2 by the third maskpattern 283. In the display device according to the first embodiment ofthe present disclosure, the third mask pattern 283 is provided tosurround the third subpixel P3 such that the second electrode 333 of thethird subpixel P3 does not electrically connect the second electrode 331of the first subpixel P1 with the second electrode 332 of the secondsubpixel P2.

Meanwhile, the third mask pattern 283 can be formed of, but not limitedto, the same material as that of the first electrodes 311, 312 and 313on the same layer as the first electrodes 311, 312 and 313.

As shown in FIGS. 4 and 5, the third mask pattern 283 can be formed ofthe same material as that of the first electrodes 311, 312 and 313 onthe same layer as the first electrodes 311, 312 and 313. At this time,the third mask pattern 283 can be spaced apart from the first electrodes311, 312 and 313.

If the third opening area OA3 of the second insulating film 260 isarranged between the first subpixel P1 and the third subpixel P3, thethird mask pattern 283 is spaced apart from the first electrode 311 ofthe first subpixel P1 such that it is not electrically connected withthe first electrode 311 of the first subpixel P1. The third mask pattern283 can be provided on the planarization film 270 as well as the secondinsulating film 260 exposed without being covered by the planarizationfilm 270.

Also, if the third opening area OA3 of the second insulating film 260 isarranged between the second subpixel P2 and the third subpixel P3, thethird mask pattern 283 is spaced apart from the second electrode 312 ofthe second subpixel P2 such that it is not electrically connected withthe second electrode 312 of the second subpixel P2. The third maskpattern 283 can be provided on the planarization film 270 as well as thesecond insulating film 260 exposed without being covered by theplanarization film 270.

In this case, in the display device, the third mask pattern 283 isformed of the same material as that of the first electrodes 311, 312 and313 on the same layer as the first electrodes 311, 312 and 313. As aresult, the third mask pattern 283 is formed without adding a separateprocess.

However, without limitation to this case, the third mask pattern 283 canbe provided on a layer different from the first electrodes 311, 312 and313. The third mask pattern 283 can be provided between the secondinsulating film 260 and the planarization film 270.

The bank 315 can be provided on the planarization film 270 to cover endsof the first electrodes 311, 312 and 313. Therefore, a problem thatlight emission efficiency is deteriorated due to a current concentratedon the ends of the first electrodes 311, 312 and 313 can be avoided.

Meanwhile, the bank 315 is not provided on the opening areas OA1, OA2,OA3 and OA4 of the second insulating film 260. Therefore, the firstconnection electrodes 241, 242 and 360 and the second connectionelectrode 250 can partially still be exposed.

Also, the bank 315 can be provided on the mask patterns 281, 282 and283. At this time, the bank 315 can be provided such that theprotrusions 281 a, 282 a and 283 a of the mask patterns 281, 282 and 283can be exposed without being covered.

If the bank 315 is provided to cover the protrusions 281 a, 282 a and283 a of the mask patterns 281, 282 and 283, the first light emittinglayers 321, 322 and 323 of the subpixels P1, P2 and P3 can be connectedwith one another without being disconnected from one another. Also, thesecond electrodes 331, 332 and 333 of the subpixels P1, P2 and P3 can beconnected with one another without being disconnected from one another.Therefore, problems can occur in that the second electrode 331 of thefirst subpixel P1 is not connected to the first power line 241, thesecond electrode 332 of the second subpixel P2 is not connected to thesecond power line 242, and the second electrode 333 of the thirdsubpixel P3 is not connected to the second connection electrode 250.

In the display device according to the first embodiment of the presentdisclosure, the bank 315 should be provided to expose the protrusions281 a, 282 a and 283 a of the mask patterns 281, 282 and 283 withoutcovering them so as not to cause the problems.

The bank 315 defines a light emitting area in each of the plurality ofsubpixels P1, P2 and P3. That is, an exposed area of each of the firstelectrodes 311, 312 and 313, where the bank 315 is not provided in eachof the subpixels P1, P2 and P3, becomes a light emitting area. Althoughthe bank 315 can be made of a relatively thin inorganic insulating film,the bank 315 can be made of a relatively thick organic insulating film.

The first light emitting layers 321, 322 and 323 are provided on thefirst electrodes 311, 312 and 313. The first light emitting layers 321,322 and 323 can be provided on the bank 315. The first light emittinglayers 321, 322 and 323 can include a hole transporting layer, a lightemitting layer, and an electron transporting layer. In this case, holesand electrons of the first light emitting layers 321, 322 and 323respectively move to the light emitting layer through the holetransporting layer and the electron transporting layer, and are combinedwith each other in the light emitting layer to emit light of apredetermined color.

Each of the first light emitting layers 321, 322 and 323 can be any oneof, but not limited to, a red light emitting layer for emitting redlight, a green light emitting layer for emitting green light, a bluelight emitting layer for emitting blue light, and a yellow lightemitting layer for emitting yellow light.

The first light emitting layers 321, 322 and 323 are disconnected amongthe first subpixel P1, the second subpixel P2 and the third subpixel P3.The mask patterns 281, 282 and 283 are provided among the first subpixelP1, the second subpixel P2 and the third subpixel P3. The first lightemitting layers 321, 322 and 323 can be disconnected from one another bythe mask patterns 281, 282 and 283.

In more detail, the first light emitting layers 321, 322 and 323 can bedisconnected between the first subpixel SP1 and the second subpixel SP2by the second mask pattern 282. If the first light emitting layers 321,322 and 323 are deposited on the entire surface without a mask, thefirst light emitting layer 321 deposited on the first subpixel P1 can bedisconnected on the protrusion 282 a of the second mask pattern 282 dueto a step difference between the protrusion 282 a of the second maskpattern 282 and the second power line 242 as shown in FIGS. 4 and 10.The first light emitting layer 322 deposited on the second subpixel P2can enter a space between the protrusion 282 a of the second maskpattern 282 and the second power line 242 and then can be provided belowthe protrusion 282 a of the second mask pattern 282 as shown in FIGS. 4and 10.

In the display device according to the first embodiment of the presentdisclosure, it is preferable that the first light emitting layer 321 ofthe first subpixel P1 and the first light emitting layer 322 of thesecond subpixel P2 are disconnected from each other without being incontact with each other. For this reason, if the second electrodes 331,332 and 333 are entirely deposited on the first light emitting layers321, 322 and 323, it is possible to make sure of a space where thesecond electrode 332 deposited on the second subpixel P2 can enterbetween the protrusion 282 a of the second mask pattern 282 and thefirst light emitting layer 322 of the second subpixel P2.

Also, the first light emitting layers 321, 322 and 323 can bedisconnected between the second subpixel P2 and the third subpixel P3 bythe third mask pattern 283. If the first light emitting layers 321, 322and 323 are deposited on the entire surface without a mask, the firstlight emitting layer 322 deposited on the second subpixel P2 can bedisconnected on the protrusion 283 a of the third mask pattern 283 dueto a step difference between the protrusion 283 a of the third maskpattern 283 and the second connection electrode 250 as shown in FIGS. 4and 10. The first light emitting layer 323 deposited on the thirdsubpixel P3 can enter a space between the protrusion 283 a of the thirdmask pattern 283 and the second connection electrode 250 and then can beprovided below the protrusion 283 a of the third mask pattern 283 asshown in FIGS. 4 and 10.

In the display device according to the first embodiment of the presentdisclosure, it is preferable that the first light emitting layer 322 ofthe second subpixel P2 and the first light emitting layer 323 of thethird subpixel P3 are disconnected from each other without being incontact with each other. For this reason, if the second electrodes 331,332 and 333 are entirely deposited on the first light emitting layers321, 322 and 323, it is possible to make sure of a space where thesecond electrode 333 deposited on the third subpixel P3 can enterbetween the protrusion 283 a of the third mask pattern 283 and the firstlight emitting layer 323 of the third subpixel P3.

Also, the first light emitting layers 321, 322 and 323 can bedisconnected between the first subpixel P1 and the third subpixel P3 bythe third mask pattern 283 and the first mask pattern 281. The thirdmask pattern 283 and the first mask pattern 281 can be provided to bespaced apart from each other between the first subpixel P1 and the thirdsubpixel P3 as shown in FIG. 5. At this time, the first mask pattern 281includes a protrusion 281 a protruded from the third subpixel P3 in adirection of the first subpixel P1, covering a portion of the firstopening area OA1. The third mask pattern 283 includes a protrusion 283 aprotruded from the first subpixel P1 in a direction of the thirdsubpixel P3, covering a portion of the third opening area OA3.

If the first light emitting layers 321, 322 and 323 are deposited on theentire surface without a mask, the first light emitting layer 323deposited on the third subpixel P3 can enter a space between theprotrusion 283 a of the third mask pattern 283 and the first insulatingfilm 220 and then can be provided below the protrusion 283 a of thethird mask pattern 283 as shown in FIGS. 5 and 10. The first lightemitting layer 321 deposited on the first subpixel P1 can enter a spacebetween the protrusion 281 a of the first mask pattern 281 and the firstpower line 241 and then can be provided below the protrusion 281 a ofthe first mask pattern 281 as shown in FIGS. 5 and 10.

The second electrodes 331, 332 and 333 are provided on the first lightemitting layers 321, 322 and 323. The second electrodes 331, 332 and 333are disconnected among the first subpixel P1, the second subpixel P2 andthe third subpixel P3. The mask patterns 281, 282 and 283 are providedamong the first subpixel P1, the second subpixel P2 and the thirdsubpixel P3. The first light emitting layers 321, 322 and 323 can bedisconnected from one another by the mask patterns 281, 282 and 283.

In more detail, the second electrodes 331, 332 and 333 can bedisconnected between the first subpixel SP1 and the second subpixel SP2by the second mask pattern 282. If the second electrodes 331, 332 and333 are deposited on the entire surface, the second electrode 331deposited on the first subpixel P1 can be disconnected on the protrusion282 a of the second mask pattern 282 due to a step difference betweenthe protrusion 282 a of the second mask pattern 282 and the second powerline 242 as shown in FIGS. 4 and 10.

The second electrode 332 deposited on the second subpixel P2 can enter aspace between the protrusion 282 a of the second mask pattern 282 andthe first light emitting layer 322 and then can be provided below theprotrusion 282 a of the second mask pattern 282 as shown in FIGS. 4 and10. At this time, the second electrode 332 of the second subpixel P2 canbe deposited below the protrusion 282 a of the second mask pattern 282at an area wider than the first light emitting layer 322. Therefore, thesecond electrode 332 of the second subpixel P2 can be connected to thesecond power line 242.

Since the second electrode 332 of the second subpixel P2 is connected tothe second power line 242, the second electrode 332 and the thirdelectrode 350 can electrically be connected with each other through thesecond power line 242 and the auxiliary power line 360. For this reason,if a low potential voltage is applied to the third electrode 350, thesame low potential voltage as the third electrode 350 can be applied tothe second electrode 332 of the second subpixel P2. At this time, thesecond electrode 332 of the second subpixel P2 can be a cathodeelectrode.

Although FIGS. 4 and 10 illustrate that the second electrode 331 of thefirst subpixel P1 and the second electrode 332 of the second subpixel P2are disconnected from each other without being in contact with eachother, the present disclosure is not limited to the examples of FIGS. 4and 10. The second electrodes 331 and 332 of the first subpixel P1 andthe second subpixel P2 are all cathode electrodes, and a common voltagecan be applied thereto. The second electrodes 331 and 332 of the firstsubpixel P1 and the second subpixel P2 can be provided to be in contactwith each other and then electrically be connected with each other.

Also, the second electrodes 331, 332 and 333 can be disconnected betweenthe second subpixel P2 and the third subpixel P3 by the third maskpattern 283. If the second electrodes 331, 332 and 333 are deposited onthe entire surface, the second electrode 332 deposited on the secondsubpixel P2 can be disconnected on the protrusion 283 a of the thirdmask pattern 283 due to a step difference between the protrusion 283 aof the third mask pattern 283 and the first light emitting layer 323 asshown in FIGS. 4 and 10.

The second electrode 333 deposited on the third subpixel P3 can enter aspace between the protrusion 283 a of the third mask pattern 283 and thefirst light emitting layer 323 and then can be provided below theprotrusion 283 a of the third mask pattern 283 as shown in FIGS. 4 and10. At this time, the second electrode 333 of the third subpixel P3 canbe deposited below the protrusion 283 a of the third mask pattern 283 atan area wider than the first light emitting layer 323. Therefore, thesecond electrode 333 of the third subpixel P3 can be connected to thesecond connection electrode 250.

Since the second electrode 333 of the third subpixel P3 is connected tothe second connection electrode 250, the second electrode 333 and thefirst electrode 313 can electrically be connected with each otherthrough the second connection electrode 250. For this reason, if a thirdhigh potential voltage is applied to the first electrode 313, the samethird high potential voltage as the first electrode 313 can be appliedto the second electrode 333 of the third subpixel P3. At this time, thesecond electrode 333 of the third subpixel P3 can be an anode electrode.

In the display device according to the first embodiment of the presentdisclosure, it is preferable that the second electrode 332 of the secondsubpixel P2 and the second electrode 333 of the third subpixel P3 aredisconnected from each other without being in contact with each other.As described above, the second electrode 332 of the second subpixel P2is a cathode electrode, and the second electrode 333 of the thirdsubpixel P3 is an anode electrode. In this case, if the second electrode332 of the second subpixel P2 and the second electrode 333 of the thirdsubpixel P3 are in contact with each other, short occurs between thesecond electrode 332 of the second subpixel P2 and the second electrode333 of the third subpixel P3, whereby the display device is not drivennormally.

Also, the second electrodes 331, 332 and 333 can be disconnected betweenthe first subpixel P1 and the third subpixel P3 by the third maskpattern 283 and the first mask pattern 281.

If the second electrodes 331, 332 and 333 are deposited on the entiresurface, the second electrode 333 can enter a space between theprotrusion 283 a of the third mask pattern 283 and the first lightemitting layer 323 and then can be provided below the protrusion 283 aof the third mask pattern 283 as shown in FIGS. 5 and 10.

At this time, the second electrode 333 of the third subpixel P3 can bedeposited below the protrusion 283 a of the third mask pattern 283 at anarea wider than the first light emitting layer 323. Although FIG. 5illustrates that the second connection electrode 250 is not providedbetween the first subpixel P1 and the third subpixel P3, the presentdisclosure is not limited to the example of FIG. 5. The secondconnection electrode 250 can be provided between the first subpixel P1and the third subpixel P3 as shown in FIG. 9. In this case, the secondelectrode 333 of the third subpixel P3 can be connected to the secondconnection electrode 250 between the first subpixel P1 and the thirdsubpixel P3.

The second electrode 331 deposited on the first subpixel P1 can enter aspace between the protrusion 281 a of the first mask pattern 281 and thefirst light emitting layer 321 and then can be provided below theprotrusion 281 a of the first mask pattern 281 as shown in FIGS. 5 and10.

At this time, the second electrode 331 of the first subpixel P1 can bedeposited below the protrusion 281 a of the first mask pattern 281 at anarea wider than the first light emitting layer 321. Therefore, thesecond electrode 331 of the first subpixel P1 can be connected to thefirst power line 241.

Since the second electrode 331 of the first subpixel P1 is connected tothe first power line 241, the second electrode 331 and the thirdelectrode 350 can electrically be connected with each other through thefirst power line 241 and the auxiliary power line 360. For this reason,if a low potential voltage is applied to the third electrode 350, thesame low potential voltage as the third electrode 350 can be applied tothe second electrode 331 of the first subpixel P1. At this time, thesecond electrode 331 of the first subpixel P1 can be a cathodeelectrode.

The second electrodes 331, 332 and 333 can be formed of a transparentconductive material (TCO) such as ITO and IZO, which can transmit light,or a semi-transmissive conductive material such as Mg, Ag, or an alloyof Mg and Ag.

The second light emitting layer 340 is provided on the second electrodes331, 332 and 333. The second light emitting layer 340 can include a holetransporting layer, a light emitting layer, and an electron transportinglayer. In this case, holes and electrons of the second light emittinglayer 340 respectively move to the light emitting layer through the holetransporting layer and the electron transporting layer, and are combinedwith each other in the light emitting layer to emit light of apredetermined color.

The second light emitting layer 340 can be any one of, but not limitedto, a red light emitting layer for emitting red light, a green lightemitting layer for emitting green light, a blue light emitting layer foremitting blue light, and a yellow light emitting layer for emittingyellow light.

However, the second light emitting layer 340 can emit light of a colordifferent from those of the first light emitting layers 321, 322 and323. If the first light emitting layers 321, 322 and 323 are lightemitting layers for emitting light of a first color, the second lightemitting layer 340 can be a light emitting layer for emitting light of asecond color different from the first color. For example, the firstlight emitting layers 321, 322 and 323 can be yellow light emittinglayers for emitting yellow light, and the second light emitting layer340 can be a blue light emitting layer for emitting blue light.

Unlike the first light emitting layers 321, 322 and 323, the secondlight emitting layer 340 is connected among the first subpixel P1, thesecond subpixel P2 and the third subpixel P3. The second light emittinglayer 340 can be formed to partially fill the spaces between the maskpatterns 281, 282 and 283 and the second electrodes 331, 332 and 333. Atthis time, an air gap AG can be formed in a space where the second lightemitting layer 340 is not filled between the mask patterns 281, 282 and283 and the second electrodes 331, 332 and 333.

The third electrode 350 is provided on the second light emitting layer340. The third electrode 350 can be formed of a transparent metalmaterial, a semi-transmissive metal material, or a metal material withhigh reflexibility. If the display device 100 is formed in a bottomemission type, the third electrode 350 can be formed of a metal materialwith high reflexibility such as a deposited structure (Ti/Al/Ti) of Aland Ti, a deposited structure (ITO/Al/ITO) of Al and ITO, an Ag alloy,and a deposited structure (ITO/Ag alloy/ITO) of Ag alloy and ITO. The Agalloy can be an alloy of Ag, Pd and Cu. If the display device 100 isformed in a top emission type, the third electrode 350 can be formed ofa transparent conductive material (TCO) such as ITO and IZO, which cantransmit light, or a semi-transmissive conductive material such as Mg,Ag, or an alloy of Mg and Ag. The third electrode 350 can be a cathodeelectrode.

The display device according to the first embodiment of the presentdisclosure is characterized in that one of the first light emittinglayers 321, 322 and 323 and the second light emitting layer 340 fromeach of the first subpixels P1, P2 and P3 emits light.

In more detail, the first light emitting layer 321 of the first subpixelP1 emits light. Since the second electrode 331 of the first subpixel P1is connected to the first power line 241, the second electrode 331 andthe second electrode 350 are electrically connected with each otherthrough the first power line 241 and the auxiliary power line 360. If alow potential voltage is applied to the third electrode 350, the samelow potential voltage as the third electrode 350 is applied to thesecond electrode 331 of the first subpixel P1. Therefore, the secondlight emitting layer 340 provided between the second electrode 331 andthe third electrode 350 of the first subpixel P1 does not emit light.

Meanwhile, in the first subpixel P1, if a first high potential voltageis applied to the first electrode 311 and a low potential voltage isapplied to the second electrode 331, the first light emitting layer 321provided between the first electrode 311 and the second electrode 331emits light with predetermined brightness in accordance with apredetermined current.

In the second subpixel P2, the first light emitting layer 322 emitslight. Since the second electrode 332 of the second subpixel P2 isconnected to the second power line 242, the second electrode 332 and thethird electrode 350 are electrically connected with each other throughthe second power line 242 and the auxiliary power line 360. If the lowpotential voltage is applied to the third electrode 350, the same lowpotential voltage as the second electrode 350 is applied to the secondelectrode 332 of the second subpixel P2. Therefore, the second lightemitting layer 340 provided between the second electrode 332 and thethird electrode 350 of the second subpixel P2 does not emit light.

Meanwhile, in the second subpixel P2, if a second high potential voltageis applied to the first electrode 312 and a low potential voltage isapplied to the second electrode 332, the first light emitting layer 322provided between the first electrode 312 and the second electrode 332emits light with predetermined brightness in accordance with apredetermined current.

That is, in the first subpixel P1 and the second subpixel P2, the firstlight emitting layers 321 and 322 emit light of the same color. Thedisplay device according to the first embodiment of the presentdisclosure can further comprise a color filter to emit light ofdifferent colors from the first subpixel P1 and the second subpixel P2.

The color filter can include a first color filter arranged to correspondto the first subpixel P1 and a second color filter arranged tocorrespond to the second subpixel P2. The first color filter and thesecond color filter can transmit light of different colors.

For example, the first light emitting layers 321, 322 and 323 can beyellow light emitting layers for emitting yellow light. The first colorfilter can be a red color filter for transmitting red light, and thesecond color filter can be a green color filter for transmitting greenlight. Therefore, the first subpixel P1 can emit red light, and thesecond subpixel P2 can emit green light.

The color filter can be arranged below the first electrodes 311, 312 and313 or on the third electrode 350 in accordance with a light emissiontype of the display device 100. If the display device 100 is a bottomemission type, the color filter can be provided below the firstelectrodes 311, 312 and 313. If the display device 100 is a top emissiontype, the color filter can be provided on the third electrode 350.

In the third subpixel P3, the second light emitting layer 340 emitslight. Since the second electrode 333 of the third subpixel P3 isconnected to the second connection electrode 250, the first electrode313 and the second electrode 333 are electrically connected with eachother through the second connection electrode 250. If a third highpotential voltage is applied to the first electrode 313, the same thirdhigh potential voltage as the first electrode 313 is applied to thesecond electrode 333 of the third subpixel P3. Therefore, the firstlight emitting layer 323 provided between the first electrode 313 andthe second electrode 333 of the third subpixel P3 does not emit light.

Meanwhile, in the third subpixel P3, if a third high potential voltageis applied to the second electrode 333 and a low potential voltage isapplied to the third electrode 350, the second light emitting layer 340provided between the second electrode 333 and the third electrode 350emits light with predetermined brightness in accordance with apredetermined current.

For example, the third subpixel P3 can be a blue light emitting layerfor emitting blue light. In this case, the display device 100 can embodya blue subpixel without providing a separate color filter in a positioncorresponding to the third subpixel P3.

As described above, in the display device 100 according to the firstembodiment of the present disclosure, only the first light emittinglayers 321, 322 and 323 emit light in the first subpixel P1 and thesecond subpixel P2, and only the second light emitting layer 340 canemit in the third subpixel P3. For this reason, in the display device100 according to the first embodiment of the present disclosure, powerconsumption can remarkably be reduced as compared with the case that allof the first light emitting layers 321, 322 and 323 and the second lightemitting layer 340 emit light in all the subpixels.

Also, in the display device 100 according to the first embodiment of thepresent disclosure, the first light emitting layers 321, 322 and 323 andthe second light emitting layer 340 are provided on the entire surfaceof the subpixels P1, P2 and P3 without a mask. Therefore, in the displaydevice 100 according to the first embodiment of the present disclosure,a problem according to the case that different light emitting layers areprovided to be patterned for each of the subpixels P1, P2 and P3 using amask can be solved.

Also, in the display device 100 according to the first embodiment of thepresent disclosure, the second electrodes 331, 332 and 333 can bedisconnected among the subpixels P1, P2 and P3 by the mask patterns 281,282 and 283. In the display device 100 according to the first embodimentof the present disclosure, the mask patterns 281, 282 and 283 areprovided, and the first light emitting layers 321, 322 and 323 and thesecond electrodes 331, 332 and 333 are provided on the entire surface ofthe first substrate 111, on which the mask patterns 281, 282 and 283 areprovided, without a mask. The first light emitting layers 321, 322 and323 and the second electrodes 331, 332 and 333 are disconnected amongthe subpixels P1, P2 and P3 by the mask patterns 281, 282 and 283.Particularly, the second electrodes 331, 332 and 333 are connected toany one of the first power line 241, the second power line 242 and thesecond connection electrode 250 below the protrusions 281 a, 282 a and283 a of the mask patterns 281, 282 and 283.

Referring to FIG. 10, in the display device 100 according to the firstembodiment of the present disclosure, a thickness T1 of the secondinsulating film 260 can be designed such that the second electrodes 331,332 and 333 are disconnected among the subpixels P1, P2 and P3 and thesecond light emitting layer 340 is connected without being disconnectedamong the subpixels P1, P2 and P3. At this time, the thickness T1 of thesecond insulating film 260 can correspond to a spaced distance betweenthe protrusions 281 a, 282 a and 283 a of the mask patterns 281, 282 and283 and any one of the first power line 241, the second power line 242and the second connection electrode 250.

The thickness T1 of the second insulating film 260 can be designed to begreater than a sum of a thickness T3 of the first light emitting layers321, 322 and 323 and a thickness T2 of the second electrodes 331, 332and 333. Therefore, in the display device 100 according to the firstembodiment of the present disclosure, the second electrodes 331, 332 and333 can be prevented from being connected with one another among thesubpixels P1, P2 and P3.

The thickness T1 of the second insulating film 260 can be designed to besmaller than a sum of the thickness T3 of the second electrodes 331, 332and 333 and a thickness T3 of the second light emitting layer 340.Therefore, in the display device 100 according to the first embodimentof the present disclosure, the second light emitting layer 340 can beprevented from being disconnected among the subpixels P1, P2 and P3.

Meanwhile, in the display device 100 according to the first embodimentof the present disclosure, a length L1 of the protrusions 281 a, 282 aand 283 a of the mask patterns 281, 282 and 283 can properly bedesigned. If the length L1 of the protrusions 281 a, 282 a and 283 a ofthe mask patterns 281, 282 and 283 becomes too long, the protrusions 281a, 282 a and 283 a of the mask patterns 281, 282 and 283 can sag downdue to a weight. In this case, a space enough to form the first lightemitting layers 321, 322 and 323 and the second electrodes 331, 332 and333 below the protrusions 281 a, 282 a and 283 a of the mask patterns281, 282 and 283 may not be ensured.

Meanwhile, in the display device 100 according to the first embodimentof the present disclosure, if the length L1 of the protrusions 281 a,282 a and 283 a of the mask patterns 281, 282 and 283 becomes too short,a contact area between the second electrodes 331, 332 and 333 and anyone of the first power line 241, the second power line 242 and thesecond connection electrode 250 can be reduced. In this case, resistancebetween the second electrodes 331, 332 and 333 and any one of the firstpower line 241, the second power line 242 and the second connectionelectrode 250 can be increased.

Second Embodiment

FIG. 13 is a plane view briefly illustrating a first substrate accordingto the second embodiment of the present disclosure, FIG. 14 is across-sectional view illustrating an example taken along line V-V ofFIG. 13, and FIG. 15 is a plane view briefly illustrating an example ofa first subpixel and a second subpixel.

Referring to FIGS. 13 to 15, the display panel 110 according to thesecond embodiment of the present disclosure comprises a first substrate111, a light-shielding layer 210, a first insulating film 220, a drivingtransistor 230, first connection electrodes 241, 242 and 360, a secondconnection electrode 250, a second insulating film 260, a planarizationfilm 270, mask patterns 281, 282 and 283, first electrodes 311, 312 and313, a bank 315, first light emitting layers 321, 322 and 323, secondelectrodes 331, 332 and 333, a second light emitting layer 340, and athird electrode 350.

The display panel 110 according to the second embodiment of the presentdisclosure is different from the display panel 110 according to thefirst embodiment of the present disclosure shown in FIGS. 3 to 12 inthat the first power line 241 and the second power line 242 of the firstconnection electrode are formed in a single body. Therefore, elementsexcept the first connection electrodes 241, 242 and 360 and the maskpatterns 281, 282 and 283 of the display panel 110 according to thesecond embodiment of the present disclosure are substantially the sameas the elements of the display panel 110 according to the firstembodiment of the present disclosure. Hereinafter, a detaileddescription of the first substrate 111, the light-shielding layer 210,the first insulating film 220, the driving transistor 230, the secondinsulating film 260, the planarization film 270, the first electrodes311, 312 and 313, the bank 315, the first light emitting layers 321, 322and 323, the second electrodes 331, 332 and 333, the second lightemitting layer 340, and the third electrode 350 of the display panel 110according to the second embodiment of the present disclosure will beomitted.

The first connection electrodes 241, 242 and 360 and the secondconnection electrode 250 are provided on the first substrate 111.

The first connection electrodes 241, 242 and 360 electrically connectthe second electrodes 331 and 332 and the third electrode 350 of thefirst subpixel P1 and the second subpixel P2 with each other. In moredetail, the first connection electrodes 241, 242 and 360 can include afirst power line 241, a second power line 242 and an auxiliary powerline 360.

The auxiliary power line 360 is provided to be extended from thenon-display area NDA to a first direction (e.g., X-axis direction). Theauxiliary power line 360 can partially be exposed without being coveredby the first insulating film 220, the second insulating film 260 and theplanarization film 270, and can be connected with the third electrode350 at the exposed area.

The first power line 241 is arranged between the first subpixel P1 andthe second subpixel P2 in the display area DA and then connected withthe second electrode 331 of the first subpixel P1. The second power line242 is arranged between the first subpixel P1 and the second subpixel P2in the display area DA and then connected with the second electrode 332of the second subpixel P2. At this time, in the display device 100according to the second embodiment of the present disclosure, the firstpower line 241 and the second power line 242 are formed in a singlebody.

The first power line 241 and the second power line 242 can be providedto be extended from the display area DA to a second direction (e.g.,Y-axis direction). One ends of the first power line 241 and the secondpower line 242 are connected to the auxiliary power line 360. At thistime, the first power line 241 and the second power line 242 can beconnected to, but not limited to, the auxiliary power line 360 through acontact hole.

Each of the first power line 241 and the second power line 242 can beformed of the same material as that of any one of the active layer, thegate electrode, the source electrode and the drain electrode of thedriving transistor 230 on the same layer as any one of them.

In accordance with the aforementioned description, the second electrode331 and the third electrode 350 of the first subpixel P1 areelectrically connected with each other through the first power line 241,the second power line 242 and the auxiliary power line 360. That is, ifa low potential voltage is applied to the third electrode 350, the samelow potential voltage as the third electrode 350 is applied to thesecond electrode 331 of the first subpixel P1.

The second electrode 332 and the third electrode 350 of the secondsubpixel P2 are electrically connected with each other through the firstpower line 241, the second power line 242 and the auxiliary power line360. That is, if a low potential voltage is applied to the thirdelectrode 350, the same low potential voltage as the third electrode 350is applied to the second electrode 332 of the second subpixel P2.

The mask patterns 281, 282 and 283 are provided on the second insulatingfilm 260 to partially cover the opening areas OA1, OA2 and OA3 of thesecond insulating film 260. The mask patterns 281, 282 and 283 include afirst mask pattern 281, a second mask pattern 282, and a third maskpattern 283.

The first mask pattern 281 is provided between the first subpixel P1 andthe second subpixel P2. Particularly, the first mask pattern 281 isprovided on the second insulating film 260 provided between the firstopening area OA1 for partially exposing the first power line 241 and thesecond opening area OA2 for partially exposing the second power line242.

The first mask pattern 281 includes a protrusion 281 a protruded topartially cover the first opening area OA1. At this time, the protrusion281 a of the first mask pattern 281 is spaced apart from the first powerline 241 to form a space with the first power line 241.

The first mask pattern 281 can be protruded such that the protrusion 281a is headed for the first subpixel P1 from the second subpixel P2.Therefore, a partial area of the first opening area OA1, which isadjacent to the second subpixel P2, is covered by the first mask pattern281, and the first power line 241 is also covered by the first maskpattern 281. The other area of the first opening area OA1, which isadjacent to the first subpixel P1, still exposes the first power line241.

The first mask pattern 281 can be provided along the first power line241 in the same manner as the first opening area OA1. At this time, thefirst mask pattern 281 can be provided on the first power line 241 in aplurality of patterns having a predetermined length along a seconddirection (e.g., Y-axis direction). However, without limitation to thisexample, the first mask pattern 281 can be provided on one first powerline 241 in one line pattern extended in the second direction (Y-axisdirection).

Meanwhile, the first mask pattern 281 can be formed of, but not limitedto, the same material as that of the first electrodes 311, 312 and 313on the same layer as the first electrodes 311, 312 and 313.

The second mask pattern 282 is provided between the first subpixel P1and the second subpixel P2. Particularly, the second mask pattern 282 isprovided on the second insulating film 260 provided between the firstopening area OA1 for partially exposing the first power line 241 and thesecond opening area OA2 for partially exposing the second power line242. At this time, in the display device 100 according to the secondembodiment of the present disclosure, the first mask pattern 281 and thesecond mask pattern 282 can be formed in a single body.

The second mask pattern 282 includes a protrusion 282 a protruded topartially cover the second opening area OA2. At this time, theprotrusion 282 a of the second mask pattern 282 is spaced apart from thesecond power line 242 to form a space with the second power line 242.

The second mask pattern 282 can be protruded such that the protrusion282 a is headed for the second subpixel P2 from the first subpixel P1.Therefore, a partial area of the second opening area OA2, which isadjacent to the first subpixel P1, is covered by the second mask pattern282, and the second power line 242 is also covered by the second maskpattern 282. The other area of the second opening area OA2, which isadjacent to the second subpixel P2, still exposes the second power line242.

The second mask pattern 282 can be provided along the second power line242 in the same manner as the second opening area OA2. At this time, thesecond mask pattern 282 can be provided on the second power line 242 ina plurality of patterns having a predetermined length along a seconddirection (e.g., Y-axis direction). However, without limitation to thisexample, the second mask pattern 282 can be provided on one second powerline 242 in one line pattern extended in the second direction (Y-axisdirection).

Meanwhile, the second mask pattern 282 can be formed of, but not limitedto, the same material as that of the first electrodes 311, 312 and 313on the same layer as the first electrodes 311, 312 and 313.

Third Embodiment

FIG. 16 is a plane view briefly illustrating a first substrate accordingto the third embodiment of the present disclosure, FIG. 17 is across-sectional view illustrating an example taken along line VI-VI ofFIG. 16, FIG. 18 is a cross-sectional view illustrating an example takenalong line VII-VII of FIG. 16, FIG. 19 is a plane view brieflyillustrating an example of a first subpixel and a second subpixel, FIG.20 is a plane view illustrating a modified example of FIG. 19, FIG. 21is a plane view briefly illustrating an example of a third subpixel,FIG. 22 is an enlarged view illustrating an example of an area B of FIG.17, FIG. 23 is a cross-sectional view illustrating an example takenalong line VIII-VIII of FIG. 16, FIG. 24 is a cross-sectional viewillustrating an example taken along line IX-IX of FIG. 16, FIG. 25 is aplane view illustrating a modified example of FIG. 17, and FIG. 26 is aplane view illustrating another modified example of FIG. 17.

Referring to FIGS. 16 to 26, the display panel 110 according to thethird embodiment of the present disclosure comprises a first substrate111, a light-shielding layer 210, a first insulating film 220, a drivingtransistor 230, first connection electrodes 241, 242 and 360, a thirdconnection electrode 255, a second insulating film 260, a planarizationfilm 270, mask patterns 281, 282 and 283, first electrodes 311 and 312,a bank 315, first light emitting layers 321, 322 and 323, secondelectrodes 331, 332 and 333, a second light emitting layer 340, and athird electrode 350.

Hereinafter, for convenience of description, a detailed description ofelements substantially the same as those of the display panel 110according to the first embodiment of the present disclosure shown inFIGS. 3 to 12 will be omitted.

The first substrate 111 can be made of, but not limited to, glass orplastic. The first substrate 111 can be made of a semiconductor materialsuch as silicon wafer. The first substrate 111 can be made of atransparent material or an opaque material.

The first substrate 111 is categorized into a display area DA and anon-display area NDA. A first subpixel P1, a second subpixel P2 and athird subpixel P3 can be provided on the display area DA of the firstsubstrate 111. The first subpixel P1 can be provided to emit red light,the second subpixel P2 can be provided to emit green light, and thethird subpixel P3 can be provided to emit blue light. However, thesesubpixels are not limited to this case. A fourth subpixel can further beprovided on the display area DA of the substrate 111 to emit white (W)light. Also, an arrangement sequence of the subpixels P1, P2 and P3 canbe changed in various ways.

A circuit diode which includes various signal lines, a drivingtransistor 230 and a capacitor is provided on the first substrate 111for each of the subpixels P1, P2 and P3. The signal lines can include agate line, a data line, a power line, and a reference line.

The driving transistor 230 is provided for each of the subpixels P1, P2and P3. One first transistor 232 is provided in the first subpixel P1,another one second transistor 234 is provided in the second subpixel P2,and other one third transistor can be provided in the third subpixel P3.

The driving transistor 230 supplies a predetermined voltage to the firstelectrodes 311 and 312 in accordance with the data voltage of the dataline if the gate signal is input to the gate line. The drivingtransistor 230 includes an active layer, a gate electrode, a sourceelectrode, and a drain electrode.

The first connection electrodes 241, 242 and 360 and the thirdconnection electrode 255 are provided on the first substrate 111.

The first connection electrodes 241, 242 and 360 electrically connectthe second electrodes 331 and 332 and the third electrode 350 of thefirst subpixel P1 and the second subpixel P2 with each other. In moredetail, the first connection electrodes 241, 242 and 360 can include afirst power line 241, a second power line 242 and an auxiliary powerline 360.

The auxiliary power line 360 is provided to be extended from thenon-display area NDA to a first direction (e.g., X-axis direction). Theauxiliary power line 360, as shown in FIGS. 23 and 24, can partially beexposed without being covered by the first insulating film 220, thesecond insulating film 260 and the planarization film 270, and can beconnected with the third electrode 350 at the exposed area.

The auxiliary power line 360 can be formed of, but not limited to, thesame material as that of the light-shielding layer 210 on the same layeras the light-shielding layer 210. The auxiliary power line 360 can beformed of the same material as that of any one of the active layer, thegate electrode, the source electrode and the drain electrode on the samelayer as that of any one of them.

The first power line 241 is arranged at one side of the first subpixelP1 in the display area DA and then connected with the second electrode331 of the first subpixel P1. Although the first power line 241 isarranged between the first subpixel P1 and the third subpixel P3 inFIGS. 17 to 20, the first power line 241 is not limited to the exampleof FIGS. 17 to 20. The first power line 241 can be arranged between thefirst subpixel P1 and the second subpixel P2.

The first power line 241 can be provided to be extended from the displayarea DA to a second direction (e.g., Y-axis direction). The plurality offirst subpixels P1 can be arranged along the second direction inparallel with the first power line 241. In this case, the first powerline 241 can be connected with the second electrode 331 of all of thefirst subpixels P1 arranged in parallel, or can be connected with thesecond electrode 331 of some of the first subpixels P1.

Meanwhile, the plurality of first subpixels P1 can be arranged along thesecond direction alternately with the plurality of second subpixels P2.In this case, the first power line 241 can be connected to the secondelectrode 331 of all of the plurality of first subpixels P1, or can beconnected to the second electrode 331 of some of the plurality of firstsubpixels P1. Alternatively, the first power line 241 can be connectedto the second electrodes 331 and 332 of all of the plurality of firstsubpixels P1 and the plurality of second subpixels P2, or can beconnected to the second electrodes 331 and 332 of some of the pluralityof first subpixels P1 and the plurality of second subpixels P2.

One end of the first power line 241 is connected to the auxiliary powerline 360. The first power line 241 can be connected to, but not limitedto, the auxiliary power line 360 through a contact hole as shown in FIG.23.

The first power line 241 can be formed of the same material as that ofany one of the active layer, the gate electrode, the source electrodeand the drain electrode of the first driving transistor 232 on the samelayer as any one of them.

In accordance with the aforementioned description, the second electrode331 and the third electrode 350 of the first subpixel P1 areelectrically connected with each other through the first power line 241and the auxiliary power line 360. That is, if a low potential voltage isapplied to the third electrode 350, the same low potential voltage asthe third electrode 350 is applied to the second electrode 331 of thefirst subpixel P1.

The second power line 242 is arranged at one side of the second subpixelP2 in the display area DA and then connected with the second electrode332 of the second subpixel P2. Although the second power line 242 isarranged between the first subpixel P1 and the second subpixel P2 inFIGS. 17 to 20, the second power line 242 is not limited to the exampleof FIGS. 17 to 20. The second power line 242 can be arranged between thesecond subpixel P2 and the third subpixel P3.

The second power line 242 can be provided in the display area DA, andcan be extended to the second direction (Y-axis direction). Theplurality of second subpixels P2 can be arranged along the seconddirection in parallel with the second power line 242. In this case, thesecond power line 242 can be connected with the second electrode 332 ofall of the second subpixels P2 arranged in parallel, or can be connectedwith the second electrode 332 of some of the plurality of secondsubpixels P2.

Meanwhile, the plurality of second subpixels P2 can be arranged alongthe second direction alternately with the plurality of first subpixelsP1. In this case, the second power line 242 can be connected to thesecond electrode 332 of all of the plurality of second subpixels P2, orcan be connected to the second electrode 332 of some of the plurality ofsecond subpixels P2. Alternatively, the second power line 242 can beconnected to the second electrodes 331 and 332 of all of the pluralityof first subpixels P1 and the plurality of second subpixels P2, or canbe connected to the second electrodes 331 and 332 of some of theplurality of first subpixels P1 and the plurality of second subpixelsP2.

One end of the second power line 242 is connected to the auxiliary powerline 360. The second power line 242 can be connected to, but not limitedto, the auxiliary power line 360 through a contact hole as shown in FIG.23.

The second power line 242 can be formed of the same material as that ofany one of the active layer, the gate electrode, the source electrodeand the drain electrode of the second transistor 234 on the same layeras any one of them.

In accordance with the aforementioned description, the second electrode332 and the third electrode 350 of the second subpixel P2 areelectrically connected with each other through the second power line 242and the auxiliary power line 360. That is, if a low potential voltage isapplied to the third electrode 350, the same low potential voltage asthe third electrode 350 is applied to the second electrode 332 of thesecond subpixel P2.

The third connection electrode 255 is electrically connected to thesecond electrode 333 of the third subpixel P3.

The third connection electrode 255 is arranged at one side of the thirdsubpixel P3 in the display area DA and connected with the secondelectrode 333 of the third subpixel P3.

Although FIGS. 17, 18 and 21 illustrate that the third connectionelectrode 255 is arranged between the second subpixel P2 and the thirdsubpixel P3, the third connection electrode 255 is not limited to theexamples of FIGS. 17, 18 and 21. The third connection electrode 255 canbe arranged between the third subpixel P3 and the first subpixel P1.

The third connection electrode 255 can be patterned to correspond toeach of the plurality of third subpixels P3. At this time, the thirdconnection electrodes 255 provided to correspond to each of theplurality of third subpixels P3 are spaced apart from each other so asnot to be electrically connected with each other as shown in FIG. 16.One third subpixel P3 can be connected with one third connectionelectrode 253, and the other one third subpixel P3 can be connected withthe other one third connection electrode 254. At this time, one thirdconnection electrode 253 and the other one third connection electrode254 can be patterned and spaced apart from each other so as not to beelectrically connected with each other.

The third connection electrode 255 can be any one of a source electrodeand a drain electrode of the third transistor.

The second insulating film 260 is provided on the first and secondtransistors 232 and 234, the first connection electrodes 241, 242 and360 and the third connection electrode 255. The second insulating film260 covers the first and second transistors 232 and 234 to protect thefirst and second transistors 232 and 234 and at the same time partiallyexposes the first connection electrodes 241, 242 and 360 and the thirdconnection electrode 255.

In more detail, the second insulating film 260 includes opening areasOA1, OA2, OA3 and OA4 that partially expose the first connectionelectrodes 241, 242 and 360 and the third connection electrode 255.

The second insulating film 260 can include a first opening area OA1 forpartially exposing the first power line 241 as shown in FIGS. 17 and 18.The first opening area OA1 can be provided along the first power line241. At this time, the first opening area OA1 can be provided on firstpower line 241 in one or a plurality of patterns having a predeterminedlength along the second direction (Y-axis direction).

Also, the second insulating film 260 can include a second opening areaOA2 for partially exposing the second power line 242 as shown in FIGS.17 and 18. The second opening area OA2 can be provided along the secondpower line 242. At this time, the second opening area OA2 can beprovided on one second power line 242 in one or a plurality of patternshaving a predetermined length along the second direction (Y-axisdirection).

Also, the second insulating film 260 can include a third opening areaOA3 for partially exposing the third connection electrode 255 as shownin FIGS. 17 and 18. The third opening area OA3 can be provided tosurround the third subpixel P3. Therefore, the third opening area OA3partially exposes the third connection electrode 255 in an area wherethe third connection electrode 255 is provided, and exposes the firstinsulating film 220 in an area where the third connection electrode 255is not provided.

Also, the second insulating film 260 can include a fourth opening areaOA4 for partially exposing the auxiliary power line 360 as shown inFIGS. 23 and 24. The auxiliary power line 360 is partially exposed bythe first insulating film 220, and the fourth opening area OA4 can beprovided on the exposed auxiliary power line 360.

The second insulating film 260 can be formed of an inorganic film, forexample, a silicon oxide film, a silicon nitride film or a multi-layeredfilm of the silicon oxide film and the silicon nitride film.

The planarization film 270 is provided on the second insulating film 260to planarize a step difference due to the driving transistor 230. Atthis time, the planarization film 270 is not provided on the openingareas OA1, OA2, OA3 and OA4 of the second insulating film 260.Therefore, the first connection electrodes 241, 242 and 360 and thethird connection electrode 255 can partially still be exposed.

The planarization film 270 can have a formation area smaller than thesecond insulating film 260. Therefore, the planarization film 270 canpartially expose the second insulating film 260. At this time, thesecond insulating film 260 can be exposed in an area adjacent to theopening areas OA1, OA2, OA3 and OA4 without being covered by theplanarization film 270.

The planarization film 270 can be formed of an organic film such asacrylic resin, epoxy resin, phenolic resin, polyamide resin, andpolyimide resin.

The first electrodes 311 and 312 are provided to be patterned on theplanarization film 270 for each of the subpixels P1, P2 and P3. Onefirst electrode 311 is provided on the first subpixel P1, and the otherfirst electrode 312 is provided on the second subpixel P2.

The display device 100 according to the third embodiment of the presentdisclosure is characterized in that the first electrodes 311 and 312 arenot provided on the third subpixel P3. Therefore, in the display device100 according to the third embodiment of the present disclosure,transmittance in the third subpixel P3 can be improved. Particularly, ifthe display device 100 is provided in a bottom emission type, sincelight emitted from the second light emitting layer 340 of the thirdsubpixel P3 may not pass through the first electrodes 311 and 312, lightefficiency can be improved.

The first electrodes 311 and 312 are connected to the source electrodeor the drain electrode of each of the first and second transistors 232and 234 through contact holes CH1 and CH2 that pass through the secondinsulating film 260 and the planarization film 270. The first electrode311 of the first subpixel P1 is connected to the source electrode or thedrain electrode of the first transistor 232 through the contact holeCH1, whereby a first high potential voltage is applied to the firstelectrode 311 of the first subpixel P1. The first electrode 312 of thesecond subpixel P2 is connected to the source electrode or the drainelectrode of the second transistor 234 through the contact hole CH2,whereby a second high potential voltage is applied to the firstelectrode 312 of the second subpixel P2.

The first electrodes 311 and 312 can be formed of a transparent metalmaterial, a semi-transmissive metal material, or a metal material withhigh reflexibility. If the display device 100 is formed in a bottomemission type, the first electrodes 311 and 312 can be formed of atransparent conductive material (TCO) such as ITO and IZO, which cantransmit light, or a semi-transmissive conductive material such as Mg,Ag, or an alloy of Mg and Ag. If the display device 100 is formed in atop emission type, the first electrodes 311 and 312 can be formed of ametal material with high reflexibility such as a deposited structure(Ti/Al/Ti) of Al and Ti, a deposited structure (ITO/Al/ITO) of Al andITO, an Ag alloy, and a deposited structure (ITO/Ag alloy/ITO) of Agalloy and ITO. The Ag alloy can be an alloy of Ag, Pd and Cu. The firstelectrodes 311 and 312 can be anode electrodes.

The mask patterns 281, 282 and 283 are provided on the second insulatingfilm 260 to partially cover the opening areas OA1, OA2 and OA3 of thesecond insulating film 260. The mask patterns 281, 282 and 283 include afirst mask pattern 281, a second mask pattern 282, and a third maskpattern 283.

The first mask pattern 281 includes a protrusion 281 a provided on thesecond insulating film 260 exposed without being covered by theplanarization film 270 and protruded to partially cover the firstopening area OA1 that partially exposes the first power line 241. Atthis time, the protrusion 281 a of the first mask pattern 281 is spacedapart from the first power line 241 to form a space with the first powerline 241.

The first mask pattern 281 is provided to be close to the subpixelarranged to adjoin the first subpixel P1 by interposing the firstopening area OA1. The first opening area OA1 for exposing the firstpower line 241 can be arranged, but not limited, between the firstsubpixel P1 and the third subpixel P3.

If the first opening area OA1 of the second insulating film 260 isarranged between the third subpixel P3 and the first subpixel P1, thefirst mask pattern 281 can be protruded such that the protrusion 281 ais headed for the first opening area OA1 from the third subpixel P3.Therefore, a partial area of the first opening area OA1, which isadjacent to the third subpixel P3, is covered by the first mask pattern281, and the first power line 241 is also covered by the first maskpattern 281. The other area of the first opening area OA1, which isadjacent to the first subpixel P1, still exposes the first power line241.

The first mask pattern 281 can be provided along the first power line241 in the same manner as the first opening area OA1. At this time, thefirst mask pattern 281 can be provided on one first power line 241 in aplurality of patterns having a predetermined length along a seconddirection (Y-axis direction) as shown in FIG. 19. However, the firstmask pattern 281 is not limited to the example of FIG. 19. The firstmask pattern 281 can be provided on one first power line 241 in one linepattern extended along the second direction (Y-axis direction) as shownin FIG. 20.

Meanwhile, the first mask pattern 281 can be formed of, but not limitedto, the same material as that of the first electrodes 311 and 312 on thesame layer as the first electrodes 311 and 312.

As shown in FIGS. 17 and 18, the first mask pattern 281 can be formed ofthe same material as that of the first electrodes 311 and 312 on thesame layer as the first electrodes 311 and 312. At this time, the firstmask pattern 281 can be spaced apart from the first electrodes 311 and312.

In this case, in the display device, the first mask pattern 281 isformed of the same material as that of the first electrodes 311 and 312on the same layer as the first electrodes 311 and 312. As a result, thefirst mask pattern 261 is formed without adding a separate process.

However, without limitation to this case, the first mask pattern 281 canbe provided on a layer different from the first electrodes 311 and 312.The first mask pattern 281 can be provided between the second insulatingfilm 260 and the planarization film 270.

The second mask pattern 282 includes a protrusion 282 a provided on thesecond insulating film 260 exposed without being covered by theplanarization film 270 and protruded to partially cover the secondopening area OA2 for partially exposing the second power line 242. Atthis time, the protrusion 282 a of the second mask pattern 282 is spacedapart from the second power line 242 to form a space with the secondpower line 242.

The second mask pattern 282 is provided to be close to the subpixelarranged to adjoin the second subpixel P2 by interposing the secondopening area OA2. The second opening area OA2 for exposing the secondpower line 242 can be arranged, but not limited, between the firstsubpixel P1 and the second subpixel P2.

If the second opening area OA2 of the second insulating film 260 isarranged between the first subpixel P1 and the second subpixel P2, thesecond mask pattern 282 can be protruded such that the protrusion 282 ais headed for the second opening area OA2 from the first subpixel P1.Therefore, a partial area of the second opening area OA2, which isadjacent to the first subpixel P1, is covered by the second mask pattern282, and the second power line 242 is also covered by the second maskpattern 282. The other area of the second opening area OA2, which isadjacent to the second subpixel P2, still exposes the second power line242.

The second mask pattern 282 can be provided along the second power line242 in the same manner as the second opening area OA2. At this time, thesecond mask pattern 282 can be provided on one second power line 242 ina plurality of patterns having a predetermined length along a seconddirection (Y-axis direction) as shown in FIG. 19. However, the secondmask pattern 282 is not limited to the example of FIG. 19. The secondmask pattern 282 can be provided on one second power line 242 in oneline pattern extended along the second direction (Y-axis direction) asshown in FIG. 20.

Meanwhile, the second mask pattern 282 can be formed of, but not limitedto, the same material as that of the first electrodes 311 and 312 on thesame layer as the first electrodes 311 and 312.

As shown in FIGS. 17 and 18, the second mask pattern 282 can be formedof the same material as that of the first electrodes 311 and 312 on thesame layer as the first electrodes 311 and 312. At this time, the secondmask pattern 282 can be spaced apart from the first electrodes 311 and312.

If the second opening area OA2 of the second insulating film 260 isarranged between the first subpixel P1 and the second subpixel P2, thesecond mask pattern 282 is spaced apart from the first electrode 311 ofthe first subpixel P1 such that it is not electrically connected withthe first electrode 311 of the first subpixel P1. The second maskpattern 282 can be provided on the planarization film 270 as well as thesecond insulating film 260 exposed without being covered by theplanarization film 270.

In this case, in the display device 100, the second mask pattern 282 isformed of the same material as that of the first electrodes 311 and 312on the same layer as the first electrodes 311 and 312. As a result, thesecond mask pattern 282 is formed without adding a separate process.

However, without limitation to this case, the second mask pattern 282can be provided on a layer different from the first electrodes 311 and312. The second mask pattern 282 can be provided between the secondinsulating film 260 and the planarization film 270.

The third mask pattern 283 includes a protrusion 283 a provided on thesecond insulating film 260 exposed without being covered by theplanarization film 270 and protruded to partially cover the thirdopening area OA3 for partially exposing the third connection electrode255. At this time, the protrusion 283 a of the third mask pattern 283 isspaced apart from the third connection electrode 255 to form a spacewith the third connection electrode 255.

The third mask pattern 283 is provided to be close to the subpixelarranged to adjoin the third subpixel P3 by interposing the thirdopening area OA3. The third opening area OA3 for exposing the thirdconnection electrode 255 mad be arranged, but not limited, between thefirst subpixel P1 and the third subpixel P3 and between the secondsubpixel P2 and the third subpixel P3.

If the third opening area OA3 of the second insulating film 260 isarranged between the first subpixel P1 and the third subpixel P3, thethird mask pattern 283 can be protruded such that the protrusion 283 ais headed for the third opening area OA3 from the first subpixel P1.Therefore, a partial area of the third opening area OA3, which isadjacent to the first subpixel P1, is covered by the third mask pattern283, and the third connection electrode 255 or the first insulating film220 is also covered by the third mask pattern 283. The other area of thethird opening area OA3, which is adjacent to the third subpixel P3,still exposes the third connection electrode 255 or the first insulatingfilm 220.

Also, if the third opening area OA3 of the second insulating film 260 isarranged between the second subpixel P2 and the third subpixel P3, thethird mask pattern 283 can be protruded such that the protrusion 283 ais headed for the third opening area OA3 from the second subpixel P2.Therefore, a partial area of the third opening area OA3, which isadjacent to the second subpixel P2, is covered by the third mask pattern283, and the third connection electrode 255 or the first insulating film220 is also covered by the third mask pattern 283. The other area of thethird opening area OA3, which is adjacent to the third subpixel P3,still exposes the third connection electrode 255 or the first insulatingfilm 220.

The third mask pattern 283 can be provided to surround the thirdsubpixel P3 in the same manner as the third opening area OA3 as shown inFIG. 8. The second electrode 333 of the third subpixel P3 can bedisconnected from the second electrode 331 of the first subpixel P1 andthe second electrode 332 of the second subpixel P2 by the third maskpattern 283. In the display device according to the third embodiment ofthe present disclosure, the third mask pattern 283 is provided tosurround the third subpixel P3 such that the second electrode 333 of thethird subpixel P3 does not electrically connect the second electrode 331of the first subpixel P1 with the second electrode 332 of the secondsubpixel P2.

Meanwhile, the third mask pattern 283 can be formed of, but not limitedto, the same material as that of the first electrodes 311 and 312 on thesame layer as the first electrodes 311 and 312.

As shown in FIGS. 17 and 18, the third mask pattern 283 can be formed ofthe same material as that of the first electrodes 311 and 312 on thesame layer as the first electrodes 311 and 312. At this time, the thirdmask pattern 283 can be spaced apart from the first electrodes 311 and312.

If the third opening area OA3 of the second insulating film 260 isarranged between the first subpixel P1 and the third subpixel P3, thethird mask pattern 283 is spaced apart from the first electrode 311 ofthe first subpixel P1 such that it is not electrically connected withthe first electrode 311 of the first subpixel P1. The third mask pattern283 can be provided on the planarization film 270 as well as the secondinsulating film 260 exposed without being covered by the planarizationfilm 270.

Also, if the third opening area OA3 of the second insulating film 260 isarranged between the second subpixel P2 and the third subpixel P3, thethird mask pattern 283 is spaced apart from the second electrode 312 ofthe second subpixel P2 such that it is not electrically connected withthe second electrode 312 of the second subpixel P2. The third maskpattern 283 can be provided on the planarization film 270 as well as thesecond insulating film 260 exposed without being covered by theplanarization film 270.

In this case, in the display device, the third mask pattern 283 isformed of the same material as that of the first electrodes 311 and 312on the same layer as the first electrodes 311 and 312. As a result, thethird mask pattern 283 is formed without adding a separate process.

However, without limitation to this case, the third mask pattern 283 canbe provided on a layer different from the first electrodes 311 and 312.The third mask pattern 283 can be provided between the second insulatingfilm 260 and the planarization film 270.

The bank 315 can be provided on the planarization film 270 to cover endsof the first electrodes 311 and 312. Therefore, a problem that lightemission efficiency is deteriorated due to a current concentrated on theends of the first electrodes 311 and 312 can be avoided.

Meanwhile, the bank 315 is not provided on the opening areas OA1, OA2,OA3 and OA4 of the second insulating film 260. Therefore, the firstconnection electrodes 241, 242 and 360 and the third connectionelectrode 255 can partially still be exposed.

Also, the bank 315 can be provided on the mask patterns 281, 282 and283. At this time, the bank 315 can be provided such that theprotrusions 281 a, 282 a and 283 a of the mask patterns 281, 282 and 283can be exposed without being covered.

If the bank 315 is provided to cover the protrusions 281 a, 282 a and283 a of the mask patterns 281, 282 and 283, the first light emittinglayers 321, 322 and 323 of the subpixels P1, P2 and P3 can be connectedwith one another without being disconnected from one another. Also, thesecond electrodes 331, 332 and 333 of the subpixels P1, P2 and P3 can beconnected with one another without being disconnected from one another.Therefore, problems can occur in that the second electrode 331 of thefirst subpixel P1 is not connected to the first power line 241, thesecond electrode 332 of the second subpixel P2 is not connected to thesecond power line 242, and the second electrode 333 of the thirdsubpixel P3 is not connected to the third connection electrode 255.

In the display device according to the third embodiment of the presentdisclosure, the bank 315 should be provided to expose the protrusions281 a, 282 a and 283 a of the mask patterns 281, 282 and 283 withoutcovering them so as not to cause the problems.

The bank 315 respectively defines light emitting areas EA1 and EA2 inthe first subpixel P1 and the second subpixel P2. That is, exposed areasof the first electrodes 311 and 312, where the bank 315 is not providedin each of the first subpixel P1 and the second subpixel P2, become thelight emitting areas EA1 and EA2.

Meanwhile, the display device 100 according to the third embodiment ofthe present disclosure is characterized in that the bank 315 is notprovided in the third subpixel P3. Since the first electrode 310 is notprovided in the third subpixel P3, the bank 315 covering the ends of thefirst electrode 310 may not be provided. Therefore, in the displaydevice 100 according to the third embodiment of the present disclosure,a light emitting area EA3 of the third subpixel P3 is greater than thelight emitting area EA1 of the first subpixel P1 and the light emittingarea EA2 of the second subpixel P2. That is, the third subpixel P3 canhave a light emitting area and an opening ratio, which are greater thanthose of the first subpixel P1 and the second subpixel P2.

The light emitting area EA3 of the third subpixel P3 can be defined bythe third mark pattern 283 arranged to adjoin the third subpixel P3. Anexposed area of the second electrode 333, which is exposed in the thirdsubpixel P3 without being covered by the third mask pattern 283, canbecome the light emitting area EA3.

Although the bank 315 can be made of a relatively thin inorganicinsulating film, the bank 315 can be made of a relatively thick organicinsulating film.

The first light emitting layer 320 is provided on the first electrode310. In detail, the first light emitting layers 321 and 322 are providedon the first electrodes 311 and 312 in the first and second subpixels P1and P2. The first light emitting layers 321 and 322 can be provided onthe bank 315. The first light emitting layer 323 is provided on theplanarization film 270 in the third subpixel P3.

The first light emitting layers 321, 322 and 323 can include a holetransporting layer, a light emitting layer, and an electron transportinglayer. In this case, holes and electrons of the first light emittinglayers 321, 322 and 323 respectively move to the light emitting layerthrough the hole transporting layer and the electron transporting layer,and are combined with each other in the light emitting layer to emitlight of a predetermined color.

Each of the first light emitting layers 321, 322 and 323 can be any oneof, but not limited to, a red light emitting layer for emitting redlight, a green light emitting layer for emitting green light, a bluelight emitting layer for emitting blue light, and a yellow lightemitting layer for emitting yellow light.

The first light emitting layers 321, 322 and 323 are disconnected amongthe first subpixel P1, the second subpixel P2 and the third subpixel P3.The mask patterns 281, 282 and 283 are provided among the first subpixelP1, the second subpixel P2 and the third subpixel P3. The first lightemitting layers 321, 322 and 323 can be disconnected from one another bythe mask patterns 281, 282 and 283.

In more detail, the first light emitting layers 321, 322 and 323 can bedisconnected between the first subpixel SP1 and the second subpixel SP2by the second mask pattern 282. If the first light emitting layers 321,322 and 323 are deposited on the entire surface without a mask, thefirst light emitting layer 321 deposited on the first subpixel P1 can bedisconnected on the protrusion 282 a of the second mask pattern 282 dueto a step difference between the protrusion 282 a of the second maskpattern 282 and the second power line 242 as shown in FIGS. 17 and 22.The first light emitting layer 322 deposited on the second subpixel P2can enter a space between the protrusion 282 a of the second maskpattern 282 and the second power line 242 and then can be provided belowthe protrusion 282 a of the second mask pattern 282 as shown in FIGS. 17and 22.

In the display device according to the third embodiment of the presentdisclosure, it is preferable that the first light emitting layer 321 ofthe first subpixel P1 and the first light emitting layer 322 of thesecond subpixel P2 are disconnected from each other without being incontact with each other. For this reason, if the second electrodes 331,332 and 333 are entirely deposited on the first light emitting layers321, 322 and 323, it is possible to make sure of a space where thesecond electrode 332 deposited on the second subpixel P2 can enterbetween the protrusion 282 a of the second mask pattern 282 and thefirst light emitting layer 322 of the second subpixel P2.

Also, the first light emitting layers 321, 322 and 323 can bedisconnected between the second subpixel P2 and the third subpixel P3 bythe third mask pattern 283. If the first light emitting layers 321, 322and 323 are deposited on the entire surface without a mask, the firstlight emitting layer 322 deposited on the second subpixel P2 can bedisconnected on the protrusion 283 a of the third mask pattern 283 dueto a step difference between the protrusion 283 a of the third maskpattern 283 and the third connection electrode 255 as shown in FIGS. 17and 22. The first light emitting layer 323 deposited on the thirdsubpixel P3 can enter a space between the protrusion 283 a of the thirdmask pattern 283 and the second connection electrode 250 and then can beprovided below the protrusion 283 a of the third mask pattern 283 asshown in FIGS. 17 and 22.

In the display device according to the third embodiment of the presentdisclosure, it is preferable that the first light emitting layer 322 ofthe second subpixel P2 and the first light emitting layer 323 of thethird subpixel P3 are disconnected from each other without being incontact with each other. For this reason, if the second electrodes 331,332 and 333 are entirely deposited on the first light emitting layers321, 322 and 323, it is possible to make sure of a space where thesecond electrode 333 deposited on the third subpixel P3 can enterbetween the protrusion 283 a of the third mask pattern 283 and the firstlight emitting layer 323 of the third subpixel P3.

Also, the first light emitting layers 321, 322 and 323 can bedisconnected between the first subpixel P1 and the third subpixel P3 bythe third mask pattern 283 and the first mask pattern 281. The thirdmask pattern 283 and the first mask pattern 281 can be provided to bespaced apart from each other between the first subpixel P1 and the thirdsubpixel P3 as shown in FIG. 18. At this time, the first mask pattern281 includes a protrusion 281 a protruded from the third subpixel P3 ina direction of the first subpixel P1, covering a portion of the firstopening area OA1. The third mask pattern 283 includes a protrusion 283 aprotruded from the first subpixel P1 in a direction of the thirdsubpixel P3, covering a portion of the third opening area OA3.

If the first light emitting layers 321, 322 and 323 are deposited on theentire surface without a mask, the first light emitting layer 323deposited on the third subpixel P3 can enter a space between theprotrusion 283 a of the third mask pattern 283 and the first insulatingfilm 220 and then can be provided below the protrusion 283 a of thethird mask pattern 283 as shown in FIGS. 18 and 22. The first lightemitting layer 321 deposited on the first subpixel P1 can enter a spacebetween the protrusion 281 a of the first mask pattern 281 and the firstpower line 241 and then can be provided below the protrusion 281 a ofthe first mask pattern 281 as shown in FIGS. 18 and 22.

The second electrodes 331, 332 and 333 are provided on the first lightemitting layers 321, 322 and 323. The second electrodes 331, 332 and 333are disconnected among the first subpixel P1, the second subpixel P2 andthe third subpixel P3. The mask patterns 281, 282 and 283 are providedamong the first subpixel P1, the second subpixel P2 and the thirdsubpixel P3. The first light emitting layers 321, 322 and 323 can bedisconnected from one another by the mask patterns 281, 282 and 283.

In more detail, the second electrodes 331, 332 and 333 can bedisconnected between the first subpixel SP1 and the second subpixel SP2by the second mask pattern 282. If the second electrodes 331, 332 and333 are deposited on the entire surface, the second electrode 331deposited on the first subpixel P1 can be disconnected on the protrusion282 a of the second mask pattern 282 due to a step difference betweenthe protrusion 282 a of the second mask pattern 282 and the second powerline 242 as shown in FIGS. 17 and 22.

The second electrode 332 deposited on the second subpixel P2 can enter aspace between the protrusion 282 a of the second mask pattern 282 andthe first light emitting layer 322 and then can be provided below theprotrusion 282 a of the second mask pattern 282 as shown in FIGS. 17 and22. At this time, the second electrode 332 of the second subpixel P2 canbe deposited below the protrusion 282 a of the second mask pattern 282at an area wider than the first light emitting layer 322. Therefore, thesecond electrode 332 of the second subpixel P2 can be connected to thesecond power line 242.

Since the second electrode 332 of the second subpixel P2 is connected tothe second power line 242, the second electrode 332 and the thirdelectrode 350 can electrically be connected with each other through thesecond power line 242 and the auxiliary power line 360. For this reason,if a low potential voltage is applied to the third electrode 350, thesame low potential voltage as the third electrode 350 can be applied tothe second electrode 332 of the second subpixel P2. At this time, thesecond electrode 332 of the second subpixel P2 can be a cathodeelectrode.

Although FIGS. 17 and 22 illustrate that the second electrode 331 of thefirst subpixel P1 and the second electrode 332 of the second subpixel P2are disconnected from each other without being in contact with eachother, the present disclosure is not limited to the examples of FIGS. 17and 22. The second electrodes 331 and 332 of the first subpixel P1 andthe second subpixel P2 are all cathode electrodes, and a common voltagecan be applied thereto. The second electrodes 331 and 332 of the firstsubpixel P1 and the second subpixel P2 can be provided to be in contactwith each other and then electrically be connected with each other.

Also, the second electrodes 331, 332 and 333 can be disconnected betweenthe second subpixel P2 and the third subpixel P3 by the third maskpattern 283. If the second electrodes 331, 332 and 333 are deposited onthe entire surface, the second electrode 332 deposited on the secondsubpixel P2 can be disconnected on the protrusion 283 a of the thirdmask pattern 283 due to a step difference between the protrusion 283 aof the third mask pattern 283 and the first light emitting layer 323 asshown in FIGS. 17 and 22.

The second electrode 333 deposited on the third subpixel P3 can enter aspace between the protrusion 283 a of the third mask pattern 283 and thefirst light emitting layer 323 and then can be provided below theprotrusion 283 a of the third mask pattern 283 as shown in FIGS. 17 and22. At this time, the second electrode 333 of the third subpixel P3 canbe deposited below the protrusion 283 a of the third mask pattern 283 atan area wider than the first light emitting layer 323. Therefore, thesecond electrode 333 of the third subpixel P3 can be connected to thesecond connection electrode 250.

The second electrode 333 of the third subpixel P3 is connected to thethird connection electrode 255. The third connection electrode 255 canbe a source electrode or a drain electrode of the third transistor. Inthis case, the second electrode 333 of the third pixel P3 is directlyconnected to the third connection electrode 255, whereby a third highpotential voltage is applied to the second electrode 333 of the thirdsubpixel P3. At this time, the second electrode 333 of the thirdsubpixel P3 can be an anode electrode.

In the display device according to the third embodiment of the presentdisclosure, it is preferable that the second electrode 332 of the secondsubpixel P2 and the second electrode 333 of the third subpixel P3 aredisconnected from each other without being in contact with each other.As described above, the second electrode 332 of the second subpixel P2is a cathode electrode, and the second electrode 333 of the thirdsubpixel P3 is an anode electrode. In this case, if the second electrode332 of the second subpixel P2 and the second electrode 333 of the thirdsubpixel P3 are in contact with each other, short occurs between thesecond electrode 332 of the second subpixel P2 and the second electrode333 of the third subpixel P3, whereby the display device 100 is notdriven normally.

Also, the second electrodes 331, 332 and 333 can be disconnected betweenthe first subpixel P1 and the third subpixel P3 by the third maskpattern 283 and the first mask pattern 281.

If the second electrodes 331, 332 and 333 are deposited on the entiresurface, the second electrode 333 can enter a space between theprotrusion 283 a of the third mask pattern 283 and the first lightemitting layer 323 and then can be provided below the protrusion 283 aof the third mask pattern 283 as shown in FIGS. 18 and 22.

At this time, the second electrode 333 of the third subpixel P3 can bedeposited below the protrusion 283 a of the third mask pattern 283 at anarea wider than the first light emitting layer 323. The second electrode331 deposited on the first subpixel P1 can enter a space between theprotrusion 2831 of the first mask pattern 281 and the first lightemitting layer 321 and then can be provided below the protrusion 2831 ofthe first mask pattern 281 as shown in FIGS. 18 and 23.

At this time, the second electrode 331 of the first subpixel P1 can bedeposited below the protrusion 281 a of the first mask pattern 281 at anarea wider than the first light emitting layer 321. Therefore, thesecond electrode 331 of the first subpixel P1 can be connected to thefirst power line 241.

Since the second electrode 331 of the first subpixel P1 is connected tothe first power line 241, the second electrode 331 and the thirdelectrode 350 can electrically be connected with each other through thefirst power line 241 and the auxiliary power line 360. For this reason,if a low potential voltage is applied to the third electrode 350, thesame low potential voltage as the third electrode 350 can be applied tothe second electrode 331 of the first subpixel P1. At this time, thesecond electrode 331 of the first subpixel P1 can be a cathodeelectrode.

The second electrodes 331, 332 and 333 can be formed of a transparentconductive material (TCO) such as ITO and IZO, which can transmit light,or a semi-transmissive conductive material such as Mg, Ag, or an alloyof Mg and Ag.

The second light emitting layer 340 is provided on the second electrodes331, 332 and 333. The second light emitting layer 340 can include a holetransporting layer, a light emitting layer, and an electron transportinglayer. In this case, holes and electrons of the second light emittinglayer 340 respectively move to the light emitting layer through the holetransporting layer and the electron transporting layer, and are combinedwith each other in the light emitting layer to emit light of apredetermined color.

The second light emitting layer 340 can be any one of, but not limitedto, a red light emitting layer for emitting red light, a green lightemitting layer for emitting green light, a blue light emitting layer foremitting blue light, and a yellow light emitting layer for emittingyellow light.

However, the second light emitting layer 340 can emit light of a colordifferent from those of the first light emitting layers 321, 322 and323. If the first light emitting layers 321, 322 and 323 are lightemitting layers for emitting light of a first color, the second lightemitting layer 340 can be a light emitting layer for emitting light of asecond color different from the first color. For example, the firstlight emitting layers 321, 322 and 323 can be yellow light emittinglayers for emitting yellow light, and the second light emitting layer340 can be a blue light emitting layer for emitting blue light.

Unlike the first light emitting layers 321, 322 and 323, the secondlight emitting layer 340 is connected among the first subpixel P1, thesecond subpixel P2 and the third subpixel P3. The second light emittinglayer 340 can be formed to partially fill the spaces between the maskpatterns 281, 282 and 283 and the second electrodes 331, 332 and 333. Atthis time, an air gap AG can be formed in a space where the second lightemitting layer 340 is not filled between the mask patterns 281, 282 and283 and the second electrodes 331, 332 and 333.

The third electrode 350 is provided on the second light emitting layer340. The third electrode 350 can be formed of a transparent metalmaterial, a semi-transmissive metal material, or a metal material withhigh reflexibility. If the display device 100 is formed in a bottomemission type, the third electrode 350 can be formed of a metal materialwith high reflexibility such as a deposited structure (Ti/Al/Ti) of Aland Ti, a deposited structure (ITO/Al/ITO) of Al and ITO, an Ag alloy,and a deposited structure (ITO/Ag alloy/ITO) of Ag alloy and ITO. The Agalloy can be an alloy of Ag, Pd and Cu. If the display device 100 isformed in a top emission type, the third electrode 350 can be formed ofa transparent conductive material (TCO) such as ITO and IZO, which cantransmit light, or a semi-transmissive conductive material such as Mg,Ag, or an alloy of Mg and Ag. The third electrode 350 can be a cathodeelectrode.

The display device 100 according to the third embodiment of the presentdisclosure is characterized in that one of the first light emittinglayers 321, 322 and 323 and the second light emitting layer 340 emitslight in each of the first subpixels P1, P2 and P3.

In more detail, the first light emitting layer 321 of the first subpixelP1 emits light. Since the second electrode 331 of the first subpixel P1is connected to the first power line 241, the second electrode 331 andthe second electrode 350 are electrically connected with each otherthrough the first power line 241 and the auxiliary power line 360. If alow potential voltage is applied to the third electrode 350, the samelow potential voltage as the third electrode 350 is applied to thesecond electrode 331 of the first subpixel P1. Therefore, the secondlight emitting layer 340 provided between the second electrode 331 andthe third electrode 350 of the first subpixel P1 does not emit light.

Meanwhile, in the first subpixel P1, if a first high potential voltageis applied to the first electrode 311 and a low potential voltage isapplied to the second electrode 331, the first light emitting layer 321provided between the first electrode 311 and the second electrode 331emits light with predetermined brightness in accordance with apredetermined current.

In the second subpixel P2, the first light emitting layer 322 emitslight. Since the second electrode 332 of the second subpixel P2 isconnected to the second power line 242, the second electrode 332 and thethird electrode 350 are electrically connected with each other throughthe second power line 242 and the auxiliary power line 360. If the lowpotential voltage is applied to the third electrode 350, the same lowpotential voltage as the second electrode 350 is applied to the secondelectrode 332 of the second subpixel P2. Therefore, the second lightemitting layer 340 provided between the second electrode 332 and thethird electrode 350 of the second subpixel P2 does not emit light.

Meanwhile, in the second subpixel P2, if a second high potential voltageis applied to the first electrode 312 and a low potential voltage isapplied to the second electrode 332, the first light emitting layer 322provided between the first electrode 312 and the second electrode 332emits light with predetermined brightness in accordance with apredetermined current.

That is, in the first subpixel P1 and the second subpixel P2, the firstlight emitting layers 321 and 322 emit light of the same color. Thedisplay device according to the third embodiment of the presentdisclosure can further comprise a color filter to emit light ofdifferent colors from the first subpixel P1 and the second subpixel P2.

The color filter can include a first color filter arranged to correspondto the first subpixel P1 and a second color filter arranged tocorrespond to the second subpixel P2. The first color filter and thesecond color filter can transmit light of different colors.

For example, the first light emitting layers 321, 322 and 323 can beyellow light emitting layers for emitting yellow light. The first colorfilter can be a red color filter for transmitting red light, and thesecond color filter can be a green color filter for transmitting greenlight. Therefore, the first subpixel P1 can emit red light, and thesecond subpixel P2 can emit green light.

The color filter can be arranged below the first electrodes 311 and 312or on the third electrode 350 in accordance with a light emission typeof the display device 100. If the display device 100 is a bottomemission type, the color filter can be provided below the firstelectrodes 311 and 312. If the display device 100 is a top emissiontype, the color filter can be provided on the third electrode 350.

In the third subpixel P3, the second light emitting layer 340 emitslight. Since the first electrode 310 is not provided in the thirdsubpixel P3, the first light emitting layer 323 does not emit light.

Meanwhile, in the third subpixel P3, the second electrode 333 isconnected to the third connection electrode 255, whereby a third highpotential voltage is applied to the second electrode 333. If a lowpotential voltage is applied to the third electrode 350, the secondlight emitting layer 340 provided between the second electrode 333 andthe third electrode 350 emits light with predetermined brightness inaccordance with a predetermined current.

For example, the third subpixel P3 can be a blue light emitting layerfor emitting blue light. In this case, the display device 100 can embodya blue subpixel without providing a separate color filter in a positioncorresponding to the third subpixel P3.

As described above, in the display device 100 according to the thirdembodiment of the present disclosure, only the first light emittinglayers 321, 322 and 323 emit light in the first subpixel P1 and thesecond subpixel P2, and only the second light emitting layer 340 canemit in the third subpixel P3. For this reason, in the display device100 according to the third embodiment of the present disclosure, powerconsumption can remarkably be reduced as compared with the case that allof the first light emitting layers 321, 322 and 323 and the second lightemitting layer 340 emit light in all the subpixels.

Also, in the display device 100 according to the third embodiment of thepresent disclosure, the first light emitting layers 321, 322 and 323 andthe second light emitting layer 340 are provided on the entire surfaceof the subpixels P1, P2 and P3 without a mask. Therefore, in the displaydevice 100 according to the third embodiment of the present disclosure,a problem according to the case that different light emitting layers areprovided to be patterned for each of the subpixels P1, P2 and P3 using amask can be solved.

Also, in the display device 100 according to the third embodiment of thepresent disclosure, the second electrodes 331, 332 and 333 can bedisconnected among the subpixels P1, P2 and P3 by the mask patterns 281,282 and 283. In the display device 100 according to the third embodimentof the present disclosure, the mask patterns 281, 282 and 283 areprovided, and the first light emitting layers 321, 322 and 323 and thesecond electrodes 331, 332 and 333 are provided on the entire surface ofthe first substrate 111, on which the mask patterns 281, 282 and 283 areprovided, without a mask. The first light emitting layers 321, 322 and323 and the second electrodes 331, 332 and 333 are disconnected amongthe subpixels P1, P2 and P3 by the mask patterns 281, 282 and 283.Particularly, the second electrodes 331, 332 and 333 are connected toany one of the first power line 241, the second power line 242 and thethird connection electrode 255 below the protrusions 281 a, 282 a and283 a of the mask patterns 281, 282 and 283.

Referring to FIG. 22, in the display device 100 according to the thirdembodiment of the present disclosure, a thickness T1 of the secondinsulating film 260 can be designed such that the second electrodes 331,332 and 333 are disconnected among the subpixels P1, P2 and P3 and thesecond light emitting layer 340 is connected without being disconnectedamong the subpixels P1, P2 and P3. At this time, the thickness T1 of thesecond insulating film 260 can correspond to a spaced distance betweenthe protrusions 281 a, 282 a and 283 a of the mask patterns 281, 282 and283 and any one of the first power line 241, the second power line 242and the third connection electrode 255.

The thickness T1 of the second insulating film 260 can be designed to begreater than a sum of a thickness T3 of the first light emitting layers321, 322 and 323 and a thickness T2 of the second electrodes 331, 332and 333. Therefore, in the display device 100 according to the thirdembodiment of the present disclosure, the second electrodes 331, 332 and333 can be prevented from being connected with one another among thesubpixels P1, P2 and P3.

The thickness T1 of the second insulating film 260 can be designed to besmaller than a sum of the thickness T3 of the second electrodes 331, 332and 333, a thickness T2 of the second electrodes 331, 332 and 333 and athickness T3 of the second light emitting layer 340. Therefore, in thedisplay device 100 according to the third embodiment of the presentdisclosure, the second light emitting layer 340 can be prevented frombeing disconnected among the subpixels P1, P2 and P3.

Meanwhile, in the display device 100 according to the third embodimentof the present disclosure, a length L1 of the protrusions 281 a, 282 aand 283 a of the mask patterns 281, 282 and 283 can properly bedesigned. If the length L1 of the protrusions 281 a, 282 a and 283 a ofthe mask patterns 281, 282 and 283 becomes too long, the protrusions 281a, 282 a and 283 a of the mask patterns 281, 282 and 283 can sag downdue to a weight. In this case, a space enough to form the first lightemitting layers 321, 322 and 323 and the second electrodes 331, 332 and333 below the protrusions 281 a, 282 a and 283 a of the mask patterns281, 282 and 283 may not be ensured.

Meanwhile, if the length L1 of the protrusions 281 a, 282 a and 283 a ofthe mask patterns 281, 282 and 283 becomes too short, a contact areabetween the second electrodes 331, 332 and 333 and any one of the firstpower line 241, the second power line 242 and the third connectionelectrode 255 can be reduced. In this case, resistance between thesecond electrodes 331, 332 and 333 and any one of the first power line241, the second power line 242 and the third connection electrode 255can be increased.

Also, in the display device 100 according to the third embodiment of thepresent disclosure, the first electrode 310 is not provided on the thirdsubpixel P3. Therefore, in the display device 100 according to the thirdembodiment of the present disclosure, transmittance in the thirdsubpixel P3 can be improved. Particularly, if the display device 100 isprovided in a bottom emission type, since light emitted from the secondlight emitting layer 340 of the third subpixel P3 may not pass throughthe first electrodes 311 and 312, light efficiency can be improved.

Meanwhile, although FIG. 17 illustrates that the planarization film 270is provided in all of the first to third subpixels P1, P2 and P3, theplanarization film 270 is not limited to the example of FIG. 17. Inanother embodiment, the planarization film 270 can be provided in onlythe first and second subpixels P1 and P2 as shown in FIG. 25. That is,in the display device 100 according to the modified embodiment of thepresent disclosure, the planarization film 270 may not be provided inthe third subpixel P3. Therefore, in the display device 100 according tothe modified embodiment of the present disclosure, transmittance in thethird subpixel P3 can be more improved. Particularly, if the displaydevice 100 is provided in a bottom emission type, since light emittedfrom the second light emitting layer 340 of the third subpixel P3 maynot pass through the first electrodes 311 and 312 and the planarizationfilm 270, light loss can be reduced and light efficiency can be moreimproved.

Moreover, although FIG. 17 illustrates that the second insulating film260 is provided in all of the first to third subpixels P1, P2 and P3,the second insulating film 260 is not limited to the example of FIG. 17.In another embodiment, the second insulating film 260 and theplanarization film 270 can be provided in only the first and secondsubpixels P1 and P2 as shown in FIG. 26. That is, in the display device100 according to another modified embodiment of the present disclosure,the second insulating film 260 and the planarization film 270 may not beprovided in the third subpixel P3. Therefore, in the display device 100according to another modified embodiment of the present disclosure,transmittance in the third subpixel P3 can be maximized. If the displaydevice 100 is provided in a bottom emission type, since light emittedfrom the second light emitting layer 340 of the third subpixel P3 maynot pass through the first electrodes 311 and 312, the second insulatingfilm 260 and the planarization film 270, light loss can be minimized andlight efficiency can be maximized.

Also, in the display device 100 according to the third embodiment of thepresent disclosure, the bank 315 is not provided in the third subpixelP3. Since the first electrode 310 is not provided in the third subpixelP3, the bank 315 covering the ends of the first electrode 310 may not beprovided. Therefore, in the display device 100 according to the thirdembodiment of the present disclosure, a light emitting area EA of thethird subpixel P3 can be greater than those of the first subpixel P1 andthe second subpixel P2. That is, the third subpixel P3 can have a lightemitting area and an opening ratio, which are greater than those of thefirst subpixel P1 and the second subpixel P2.

Fourth Embodiment

FIG. 27 is a plane view briefly illustrating a first substrate of adisplay panel according to the fourth embodiment of the presentdisclosure, FIG. 28 is a cross-sectional view illustrating an exampletaken along line X-X of FIG. 27, and FIG. 29 is a plane view brieflyillustrating an example of a first subpixel and a second subpixel.

Referring to FIGS. 27 to 29, the display panel 110 according to thefourth embodiment of the present disclosure comprises a first substrate111, a light-shielding layer 210, a first insulating film 220, a drivingtransistor 230, first connection electrodes 241, 242 and 360, a thirdconnection electrode 255, a second insulating film 260, a planarizationfilm 270, mask patterns 281, 282 and 283, first electrodes 311 and 312,a bank 315, first light emitting layers 321, 322 and 323, secondelectrodes 331, 332 and 333, a second light emitting layer 340, and athird electrode 350.

The display panel 110 according to the fourth embodiment of the presentdisclosure is different from the display panel 110 according to thethird embodiment of the present disclosure shown in FIGS. 16 to 24 inthat the first power line 241 and the second power line 242 of the firstconnection electrode are formed in a single body. Therefore, elementsexcept the first connection electrodes 241, 242 and 360 and the maskpatterns 281, 282 and 283 of the display panel 110 according to thefourth embodiment of the present disclosure are substantially the sameas the elements of the display panel 110 according to the thirdembodiment of the present disclosure. Hereinafter, a detaileddescription of the first substrate 111, the light-shielding layer 210,the first insulating film 220, the driving transistor 230, the secondinsulating film 260, the planarization film 270, the third connectionelectrode 255, the first electrodes 311 and 312, the bank 315, the firstlight emitting layers 321, 322 and 323, the second electrodes 331, 332and 333, the second light emitting layer 340, and the third electrode350 of the display panel 110 according to the fourth embodiment of thepresent disclosure will be omitted.

The first connection electrodes 241, 242 and 360 are provided on thefirst substrate 111.

The first connection electrodes 241, 242 and 360 electrically connectthe second electrodes 331 and 332 and the third electrode 350 of thefirst subpixel P1 and the second subpixel P2 with each other. In moredetail, the first connection electrodes 241, 242 and 360 can include afirst power line 241, a second power line 242 and an auxiliary powerline 360.

The auxiliary power line 360 is provided to be extended from thenon-display area NDA to a first direction (e.g., X-axis direction). Theauxiliary power line 360 can partially be exposed without being coveredby the first insulating film 220, the second insulating film 260 and theplanarization film 270, and can be connected with the third electrode350 at the exposed area.

The first power line 241 is arranged between the first subpixel P1 andthe second subpixel P2 in the display area DA and then connected withthe second electrode 331 of the first subpixel P1. The second power line242 is arranged between the first subpixel P1 and the second subpixel P2in the display area DA and then connected with the second electrode 332of the second subpixel P2. At this time, in the display device 100according to the fourth embodiment of the present disclosure, the firstpower line 241 and the second power line 242 are formed in a singlebody.

The first power line 241 and the second power line 242 can be providedto be extended from the display area DA to a second direction (Y-axisdirection). One ends of the first power line 241 and the second powerline 242 are connected to the auxiliary power line 360. At this time,the first power line 241 and the second power line 242 can be connectedto, but not limited to, the auxiliary power line 360 through a contacthole.

Each of the first power line 241 and the second power line 242 can beformed of the same material as that of any one of the active layer, thegate electrode, the source electrode and the drain electrode of thedriving transistor 230 on the same layer as any one of them.

In accordance with the aforementioned description, the second electrode331 and the third electrode 350 of the first subpixel P1 areelectrically connected with each other through the first power line 241,the second power line 242 and the auxiliary power line 360. That is, ifa low potential voltage is applied to the third electrode 350, the samelow potential voltage as the third electrode 350 is applied to thesecond electrode 331 of the first subpixel P1.

The second electrode 332 and the third electrode 350 of the secondsubpixel P2 are electrically connected with each other through the firstpower line 241, the second power line 242 and the auxiliary power line360. That is, if a low potential voltage is applied to the thirdelectrode 350, the same low potential voltage as the third electrode 350is applied to the second electrode 332 of the second subpixel P2.

The mask patterns 281, 282 and 283 are provided on the second insulatingfilm 260 to partially cover the opening areas OA1, OA2 and OA3 of thesecond insulating film 260. The mask patterns 281, 282 and 283 include afirst mask pattern 281, a second mask pattern 282, and a third maskpattern 283. Since the third mask pattern 283 is substantially the sameas the third mask pattern 283 of the display panel 110 according to thethird embodiment of the present disclosure shown in FIGS. 16 to 24, itsdetailed description will be omitted.

The first mask pattern 281 is provided between the first subpixel P1 andthe second subpixel P2. Particularly, the first mask pattern 281 isprovided on the second insulating film 260 provided between the firstopening area OA1 for partially exposing the first power line 241 and thesecond opening area OA2 for partially exposing the second power line242.

The first mask pattern 281 includes a protrusion 281 a protruded topartially cover the first opening area OA1. At this time, the protrusion281 a of the first mask pattern 281 is spaced apart from the first powerline 241 to form a space with the first power line 241.

The first mask pattern 281 can be protruded such that the protrusion 281a is headed for the first subpixel P1 from the second subpixel P2.Therefore, a partial area of the first opening area OA1, which isadjacent to the second subpixel P2, is covered by the first mask pattern281, and the first power line 241 is also covered by the first maskpattern 281. The other area of the first opening area OA1, which isadjacent to the first subpixel P1, still exposes the first power line241.

The first mask pattern 281 can be provided along the first power line241 in the same manner as the first opening area OA1. At this time, thefirst mask pattern 281 can be provided on the first power line 241 in aplurality of patterns having a predetermined length along a seconddirection (Y-axis direction). However, without limitation to thisexample, the first mask pattern 281 can be provided on one first powerline 241 in one line pattern extended in the second direction (Y-axisdirection).

Meanwhile, the first mask pattern 281 can be formed of, but not limitedto, the same material as that of the first electrodes 311, 312 and 313on the same layer as the first electrodes 311, 312 and 313.

The second mask pattern 282 is provided between the first subpixel P1and the second subpixel P2. Particularly, the second mask pattern 282 isprovided on the second insulating film 260 provided between the firstopening area OA1 for partially exposing the first power line 241 and thesecond opening area OA2 for partially exposing the second power line242. At this time, in the display device 100 according to the fourthembodiment of the present disclosure, the first mask pattern 281 and thesecond mask pattern 282 can be formed in a single body.

The second mask pattern 282 includes a protrusion 282 a protruded topartially cover the second opening area OA2. At this time, theprotrusion 282 a of the second mask pattern 282 is spaced apart from thesecond power line 242 to form a space with the second power line 242.

The second mask pattern 282 can be protruded such that the protrusion282 a is headed for the second subpixel P2 from the first subpixel P1.Therefore, a partial area of the second opening area OA2, which isadjacent to the first subpixel P1, is covered by the second mask pattern282, and the second power line 242 is also covered by the second maskpattern 282. The other area of the second opening area OA2, which isadjacent to the second subpixel P2, still exposes the second power line242.

The second mask pattern 282 can be provided along the second power line242 in the same manner as the second opening area OA2. At this time, thesecond mask pattern 282 can be provided on the second power line 242 ina plurality of patterns having a predetermined length along a seconddirection (Y-axis direction). However, without limitation to thisexample, the second mask pattern 282 can be provided on one second powerline 242 in one line pattern extended in the second direction (Y-axisdirection).

Meanwhile, the second mask pattern 282 can be formed of, but not limitedto, the same material as that of the first electrodes 311 and 312 on thesame layer as the first electrodes 311 and 312.

FIG. 30 is a flow chart illustrating a method for manufacturing adisplay device according to the first embodiment of the presentdisclosure, and FIGS. 31A to 31J are cross-sectional views illustratinga method for manufacturing a display device according to the firstembodiment of the present disclosure.

First of all, as shown in FIG. 31A, the driving transistor 230, thefirst connection electrodes 241, 242 and 360 and the second connectionelectrode 250 are formed on the first substrate 111 (S3001).

In more detail, the light-shielding layer 210 is formed on the firstsubstrate 111. The light-shielding layer 210 is to shield external lightentering the active layer of the driving transistor 230 to be arrangedfor each of the subpixels P1, P2 and P3, and is formed in a positioncorresponding to the active layer of the driving transistor 230. Thelight-shielding layer 210 can be formed of a metal material. If thelight-shielding layer 210 is formed of a metal material, the auxiliarypower line 360 can be formed of the same material as that of thelight-shielding layer 210 on the same layer as the light-shielding layer210 on the first substrate 111.

Then, the first insulating film 220 is formed on the light-shield layer210. The first insulating film 220 can be formed of an inorganic film,for example, a silicon oxide (SiOx) film, a silicon nitride (SiNx) filmor a multi-layered film of the silicon oxide film and the siliconnitride film.

Then, the driving transistor 230, the first power line 241, the secondpower line 242 and the second connection electrode 250 are formed on thefirst insulating film 220.

The active layer is formed on the first insulating film 220. The activelayer can be formed of a silicon based semiconductor material or anoxide based semiconductor material.

The gate insulating film can be formed on the active layer. The gateinsulating film can be formed of an inorganic film, for example, asilicon oxide film, a silicon nitride film or a multi-layered film ofthe silicon oxide film and the silicon nitride film.

The gate electrode can be formed on the gate insulating film. The gateelectrode can be, but not limited to, a single layer or multi-layercomprised of any one of Mo, Al, Cr, Au, Ti, Ni, Nd and Cu or theiralloy.

The inter-layer dielectric film can be formed on the gate electrode. Theinter-layer dielectric film can be formed of an inorganic film, forexample, a silicon oxide film, a silicon nitride film, or amulti-layered film of the silicon oxide film and the silicon nitridefilm.

The source electrode and the drain electrode can be formed on theinter-layer dielectric film. Each of the source electrode and the drainelectrode can be connected to the active layer through the contact holethat passes through the gate insulating film and the inter-layerdielectric film. Each of the source electrode and the drain electrodecan be, but not limited to, a single layer or multi-layer comprised ofany one of Mo, Al, Cr, Au, Ti, Ni, Nd and Cu or their alloy.

Meanwhile, the first power line 241, the second power line 242 and thesecond connection electrode 250 can be formed of the same material asthat of the source electrode and the drain electrode on the same layeras the source electrode and the drain electrode.

Next, the second insulating film 260 is formed as shown in FIG. 31B(S3002).

In more detail, the second insulating film 260 is formed on the drivingtransistor 230, the first connection electrodes 241, 242 and 360, andthe second connection electrode 250

Although the contact hole which partially exposes the source electrodeor the drain electrode of the driving transistor 230 can be formed inthe second insulating film 260, formation of the contact hole is notlimited to this case. The contact hole can be formed through a laterprocess.

The second insulating film 260 can be formed of an inorganic film, forexample, a silicon oxide film, a silicon nitride film or a multi-layeredfilm of the silicon oxide film and the silicon nitride film.

Next, the planarization film 270 is formed as shown in FIG. 31C (S3003).

In more detail, the planarization film 270 is formed on the secondinsulating film 260. The planarization film 270 planarizes the stepdifference due to the driving transistor 230. The planarization film 270can be patterned to partially expose the second insulating film 260arranged in the area where the first power line 241, the second powerline 242 and the second connection electrode 250 are formed.

Although the contact hole which partially exposes the source electrodeor the drain electrode of the driving transistor 230 can be formed inthe planarization film 270, formation of the contact hole is not limitedto this case. The contact hole can be formed through a later process.

The planarization film 270 can be formed of an organic film such asacrylic resin, epoxy resin, phenolic resin, polyamide resin, andpolyimide resin.

Next, the first electrodes 311, 312 and 313 and the mask patterns 281,282 and 283 are formed as shown in FIG. 31D (S3004).

In more detail, the first electrodes 311, 312 and 313 are formed on theplanarization film 270 for each of the subpixels P1, P2 and P3. Thefirst electrodes 311, 312 and 313 are connected to the source electrodeor the drain electrode of the driving transistor 230 through the contacthole.

The first electrodes 311, 312 and 313 can be formed of a transparentmetal material, a semi-transmissive metal material, or a metal materialwith high reflexibility. If the display device 100 is formed in a bottomemission type, the first electrodes 311, 312 and 313 can be formed of atransparent conductive material (TCO) such as ITO and IZO, which cantransmit light, or a semi-transmissive conductive material such as Mg,Ag, or an alloy of Mg and Ag. If the display device 100 is formed in atop emission type, the first electrodes 311, 312 and 313 can be formedof a metal material with high reflexibility such as a depositedstructure (Ti/Al/Ti) of Al and Ti, a deposited structure (ITO/Al/ITO) ofAl and ITO, an Ag alloy, and a deposited structure (ITO/Ag alloy/ITO) ofAg alloy and ITO. The Ag alloy can be an alloy of Ag, Pd and Cu. Thefirst electrodes 311, 312 and 313 can be anode electrodes.

The mask patterns 281, 282 and 283 are formed on the planarization film270 to be spaced apart from the first electrodes 311, 312 and 313. Themask patterns 281, 282 and 283 are also formed on a partial portion ofthe second insulating film 260 exposed without being covered by theplanarization film 270.

The mask patterns 281, 282 and 283 can be formed of the same material asthat of the first electrodes 311, 312 and 313 simultaneously with thefirst electrodes 311, 312 and 313.

Next, the bank 315 is formed as shown in FIG. 31E (S3005).

In more detail, the bank 315 is formed to cover ends of each of thefirst electrodes 311, 312 and 313. The bank 315 can be patterned toexpose a partial portion of the second insulating film 260 and the maskpatterns 281, 282 and 283, which are arranged in the area where thefirst power line 241, the second power line 242 and the secondconnection electrode 250 are formed.

Next, the opening areas OA1, OA2 and OA3 are formed in the secondinsulating film 260 as shown in FIG. 31F (S1106).

In more detail, the opening area OA1, OA2 and OA3 are formed in thesecond insulating film 260 by an etching process. At this time, theetching process can be a wet etching process, and an etching solutionwhich can etch the second insulating film 260 but cannot etch the maskpatterns 281, 282 and 283 can be applied to the etching process.Therefore, an undercut structure can be formed in which the maskpatterns 281, 282 and 283 are not etched and the exposed secondinsulating film 260 is only etched.

The first opening area OA1 for partially exposing the first power line241, the second opening area OA2 for partially exposing the second powerline 242, and the third opening area OA3 for partially exposing thesecond connection electrode 250 can be formed in the second insulatingfilm 260 through the etching process.

Next, the first light emitting layers 321, 322 and 323 are formed asshown in FIG. 31G (S3007).

In more detail, the first light emitting layers 321, 322 and 323 areformed on the first electrodes 311, 312 and 313 and the mask patterns281, 282 and 283. The first light emitting layers 321, 322 and 323 canbe formed by a deposition process or a solution process. If the firstlight emitting layers 321, 322 and 323 are formed by the depositionprocess, the first light emitting layers 321, 322 and 323 can be formedusing an evaporation method.

The first light emitting layers 321, 322 and 323 are disconnected amongthe first subpixel P1, the second subpixel P2 and the third subpixel P3by the mask patterns 281, 282 and 283. The first light emitting layers321, 322 and 323 can be disconnected on the mask patterns 281, 282 and283. Also, the first light emitting layers 321, 322 and 323 can enter aspace formed below the mask patterns 281, 282 and 283 and then can beformed below the mask patterns 281, 282 and 283.

Each of the first light emitting layers 321, 322 and 323 can be any oneof, but not limited to, a red light emitting layer for emitting redlight, a green light emitting layer for emitting green light, a bluelight emitting layer for emitting blue light, and a yellow lightemitting layer for emitting yellow light.

Next, the second electrodes 331, 332 and 333 are formed as shown in FIG.31H (S3008).

In more detail, the second electrodes 331, 332 and 333 are formed on thefirst light emitting layers 321, 322 and 323. The second electrodes 331,332 and 333 are disconnected among the first subpixel P1, the secondsubpixel P2 and the third subpixel P3 by the mask patterns 281, 282 and283. The second electrodes 331, 332 and 333 can be disconnected on themask patterns 281, 282 and 283. Also, the second electrodes 331, 332 and333 can enter a space formed below the mask patterns 281, 282 and 283and then can be formed below the mask patterns 281, 282 and 283.

The second electrodes 331, 332 and 333 can be formed using a physicsvapor deposition such as sputtering. A film formed by the physics vapordeposition such as sputtering has excellent step coveragecharacteristics. Therefore, the second electrodes 331, 332 and 333 canbe formed at an area wider than the first light emitting layers 321, 322and 333 formed using evaporation. As a result, the second electrodes331, 332 and 333 can be connected to any one of the first power line241, the second power line 242 and the second connection electrode 250below the mask patterns 281, 282 and 283.

The second electrodes 331, 332 and 333 can be formed of a transparentconductive material (TCO) such as ITO and IZO, which can transmit light,or a semi-transmissive conductive material such as Mg, Ag, or an alloyof Mg and Ag.

Next, the second light emitting layer 340 is formed as shown in FIG. 31I(S3009).

In more detail, the second light emitting layer 340 is formed on thesecond electrodes 331, 332 and 333. The second light emitting layer 340can be formed by a deposition process or a solution process. If thesecond light emitting layer 340 is formed by the deposition process, thesecond light emitting layer 340 can be formed using an evaporationmethod.

The second light emitting layer 340 is connected among the firstsubpixel P1, the second subpixel P2 and the third subpixel P3. Thesecond light emitting layer 340 can be formed to partially fill thespace between the mask patterns 281, 282 and 283 and the secondelectrodes 331, 332 and 333. At this time, an air gap AG can be formedin a space where the second light emitting layer 340 is not filledbetween the mask patterns 281, 282 and 283 and the second electrodes331, 332 and 333.

The second light emitting layer 340 can be any one of, but not limitedto, a red light emitting layer for emitting red light, a green lightemitting layer for emitting green light, a blue light emitting layer foremitting blue light, and a yellow light emitting layer for emittingyellow light.

However, the second light emitting layer 340 can emit light of a colordifferent from that of the first light emitting layers 321, 322 and 323.If the first light emitting layers 321, 322 and 323 are light emittinglayers for emitting light of a first color, the second light emittinglayer 340 can be a light emitting layer for emitting light of a secondcolor different from the first color. For example, the first lightemitting layers 321, 322 and 323 can be yellow light emitting layers foremitting yellow light, and the second light emitting layer 340 can be ablue light emitting layer for emitting blue light.

Next, the third electrode 350 is formed as shown in FIG. 31J (S3010).

In more detail, the third electrode 350 is formed on the second lightemitting layer 340. The third electrode 350 can be formed by a physicsvapor deposition such as sputtering. Alternatively, the third electrode350 can be formed by evaporation.

The third electrode 350 can be formed of a transparent metal material, asemi-transmissive metal material, or a metal material with highreflexibility. If the display device 100 is formed in a bottom emissiontype, the third electrode 350 can be formed of a metal material withhigh reflexibility such as a deposited structure (Ti/Al/Ti) of Al andTi, a deposited structure (ITO/Al/ITO) of Al and ITO, an Ag alloy, and adeposited structure (ITO/Ag alloy/ITO) of Ag alloy and ITO. The Ag alloycan be an alloy of Ag, Pd and Cu. If the display device 100 is formed ina top emission type, the third electrode 350 can be formed of atransparent conductive material (TCO) such as ITO and IZO, which cantransmit light, or a semi-transmissive conductive material such as Mg,Ag, or an alloy of Mg and Ag. The third electrode 350 can be a cathodeelectrode.

FIG. 32 is a flow chart illustrating a method for manufacturing adisplay device according to the third embodiment of the presentdisclosure, and FIGS. 33A to 33J are cross-sectional views illustratinga method for manufacturing a display device according to the thirdembodiment of the present disclosure.

First of all, as shown in FIG. 33A, the first to third drivingtransistors 230, the first connection electrodes 241, 242 and 360 andthe third connection electrode 255 are formed on the first substrate 111(S3201).

In more detail, the light-shielding layer 210 is formed on the firstsubstrate 111. The light-shielding layer 210 is to shield external lightentering the active layer of the first to third driving transistors 230respectively corresponding to the first to third subpixels P1, P2 andP3, and is formed in a position corresponding to the active layer of thefirst to third driving transistors 230. The light-shielding layer 210can be formed of a metal material. If the light-shielding layer 210 isformed of a metal material, the auxiliary power line 360 can be formedof the same material as that of the light-shielding layer 210 on thesame layer as the light-shielding layer 210 on the first substrate 111.

Then, the first insulating film 220 is formed on the light-shield layer210. The first insulating film 220 can be formed of an inorganic film,for example, a silicon oxide (SiOx) film, a silicon nitride (SiNx) filmor a multi-layered film of the silicon oxide film and the siliconnitride film.

Then, the first to third driving transistors 230, the first power line241, the second power line 242 and the third connection electrode 255are formed on the first insulating film 220.

The active layer is formed on the first insulating film 220. The activelayer can be formed of a silicon based semiconductor material or anoxide based semiconductor material.

The gate insulating film can be formed on the active layer. The gateinsulating film can be formed of an inorganic film, for example, asilicon oxide film, a silicon nitride film or a multi-layered film ofthe silicon oxide film and the silicon nitride film.

The gate electrode can be formed on the gate insulating film. The gateelectrode can be, but not limited to, a single layer or multi-layercomprised of any one of Mo, Al, Cr, Au, Ti, Ni, Nd and Cu or theiralloy.

The inter-layer dielectric film can be formed on the gate electrode. Theinter-layer dielectric film can be formed of an inorganic film, forexample, a silicon oxide film, a silicon nitride film, or amulti-layered film of the silicon oxide film and the silicon nitridefilm.

The source electrode and the drain electrode can be formed on theinter-layer dielectric film. Each of the source electrode and the drainelectrode can be connected to the active layer through the contact holethat passes through the gate insulating film and the inter-layerdielectric film. Each of the source electrode and the drain electrodecan be, but not limited to, a single layer or multi-layer comprised ofany one of Mo, Al, Cr, Au, Ti, Ni, Nd and Cu or their alloy.

Meanwhile, the first power line 241 and the second power line 242 can beformed of the same material as that of the source electrode and thedrain electrode on the same layer as the source electrode and the drainelectrode.

Also, the third connection electrode 255 can be a source electrode or adrain electrode of the third driving transistor 230.

Next, the second insulating film 260 is formed as shown in FIG. 33B(S3202).

In more detail, the second insulating film 260 is formed on the first tothird driving transistors 230, the first connection electrodes 241, 242and 360, and the third connection electrode 255

Although the contact hole which partially exposes the source electrodeor the drain electrode of the first and second driving transistors 230can be formed in the second insulating film 260, formation of thecontact hole is not limited to this case. The contact hole can be formedthrough a later process.

The second insulating film 260 can be formed of an inorganic film, forexample, a silicon oxide film, a silicon nitride film or a multi-layeredfilm of the silicon oxide film and the silicon nitride film.

Next, the planarization film 270 is formed as shown in FIG. 33C (S3203).

In more detail, the planarization film 270 is formed on the secondinsulating film 260. The planarization film 270 planarizes the stepdifference due to the first to third driving transistors 230. Theplanarization film 270 can be patterned to partially expose the secondinsulating film 260 arranged in the area where the first power line 241,the second power line 242 and the third connection electrode 255 areformed.

Although the contact hole which partially exposes the source electrodeor the drain electrode of the first and second driving transistors 230can be formed in the planarization film 270, formation of the contacthole is not limited to this case. The contact hole can be formed througha later process.

The planarization film 270 can be formed of an organic film such asacrylic resin, epoxy resin, phenolic resin, polyamide resin, andpolyimide resin.

Next, the first electrodes 311 and 312 and the mask patterns 281, 282and 283 are formed as shown in FIG. 33D (S3204).

In more detail, the first electrodes 311 and 312 are formed on theplanarization film 270 for each of the first subpixel P1 and the secondsubpixel P2. The first electrodes 311 and 312 are connected to thesource electrode or the drain electrode of the first and second drivingtransistors 230 through the contact hole.

The first electrodes 311 and 312 can be formed of a transparent metalmaterial, a semi-transmissive metal material, or a metal material withhigh reflexibility. If the display device 100 is formed in a bottomemission type, the first electrodes 311 and 312 can be formed of atransparent conductive material (TCO) such as ITO and IZO, which cantransmit light, or a semi-transmissive conductive material such as Mg,Ag, or an alloy of Mg and Ag. If the display device 100 is formed in atop emission type, the first electrodes 311 and 312 can be formed of ametal material with high reflexibility such as a deposited structure(Ti/Al/Ti) of Al and Ti, a deposited structure (ITO/Al/ITO) of Al andITO, an Ag alloy, and a deposited structure (ITO/Ag alloy/ITO) of Agalloy and ITO. The Ag alloy can be an alloy of Ag, Pd and Cu. The firstelectrodes 311 and 312 can be anode electrodes.

The mask patterns 281, 282 and 283 are formed on the planarization film270 to be spaced apart from the first electrodes 311 and 312. The maskpatterns 281, 282 and 283 are also formed on a partial portion of thesecond insulating film 260 exposed without being covered by theplanarization film 270.

The mask patterns 281, 282 and 283 can be formed of the same material asthat of the first electrodes 311 and 312 simultaneously with the firstelectrodes 311 and 312.

Next, the bank 315 is formed as shown in FIG. 33E (S3205).

In more detail, the bank 315 is formed to cover ends of each of thefirst electrodes 311 and 312. The bank 315 can be patterned to expose apartial portion of the second insulating film 260 and the mask patterns281, 282 and 283, which are arranged in the area where the first powerline 241, the second power line 242 and the third connection electrode255 are formed.

Next, the opening areas OA1, OA2 and OA3 are formed in the secondinsulating film 260 as shown in FIG. 33F (S3206).

In more detail, the opening area OA1, OA2 and OA3 are formed in thesecond insulating film 260 by an etching process. At this time, theetching process can be a wet etching process, and an etching solutionwhich can etch the second insulating film 260 but cannot etch the maskpatterns 281, 282 and 283 can be applied to the etching process.Therefore, an undercut structure can be formed in which the maskpatterns 281, 282 and 283 are not etched and the exposed secondinsulating film 260 is only etched.

The first opening area OA1 for partially exposing the first power line241, the second opening area OA2 for partially exposing the second powerline 242, and the third opening area OA3 for partially exposing thethird connection electrode 255 can be formed in the second insulatingfilm 260 through the etching process.

Next, the first light emitting layers 321, 322 and 323 are formed asshown in FIG. 33G (S3207).

In more detail, the first light emitting layers 321, 322 and 323 areformed on the first electrodes 311, 312 and 313 and the mask patterns281, 282 and 283. The first light emitting layers 321, 322 and 323 canbe formed by a deposition process or a solution process. If the firstlight emitting layers 321, 322 and 323 are formed by the depositionprocess, the first light emitting layers 321, 322 and 323 can be formedusing an evaporation method.

The first light emitting layers 321, 322 and 323 are disconnected amongthe first subpixel P1, the second subpixel P2 and the third subpixel P3by the mask patterns 281, 282 and 283. The first light emitting layers321, 322 and 323 can be disconnected on the mask patterns 281, 282 and283. Also, the first light emitting layers 321, 322 and 323 can enter aspace formed below the mask patterns 281, 282 and 283 and then can beformed below the mask patterns 281, 282 and 283.

Each of the first light emitting layers 321, 322 and 323 can be any oneof, but not limited to, a red light emitting layer for emitting redlight, a green light emitting layer for emitting green light, a bluelight emitting layer for emitting blue light, and a yellow lightemitting layer for emitting yellow light.

Next, the second electrodes 331, 332 and 333 are formed as shown in FIG.33H (S3208).

In more detail, the second electrodes 331, 332 and 333 are formed on thefirst light emitting layers 321, 322 and 323. The second electrodes 331,332 and 333 are disconnected among the first subpixel P1, the secondsubpixel P2 and the third subpixel P3 by the mask patterns 281, 282 and283. The second electrodes 331, 332 and 333 can be disconnected on themask patterns 281, 282 and 283. Also, the second electrodes 331, 332 and333 can enter a space formed below the mask patterns 281, 282 and 283and then can be formed below the mask patterns 281, 282 and 283.

The second electrodes 331, 332 and 333 can be formed using a physicsvapor deposition such as sputtering. A film formed by the physics vapordeposition such as sputtering has excellent step coveragecharacteristics. Therefore, the second electrodes 331, 332 and 333 canbe formed at an area wider than the first light emitting layers 321, 322and 333 formed using evaporation. As a result, the second electrodes331, 332 and 333 can be connected to any one of the first power line241, the second power line 242 and third connection electrode 255 belowthe mask patterns 281, 282 and 283.

The second electrodes 331, 332 and 333 can be formed of a transparentconductive material (TCO) such as ITO and IZO, which can transmit light,or a semi-transmissive conductive material such as Mg, Ag, or an alloyof Mg and Ag.

Next, the second light emitting layer 340 is formed as shown in FIG. 33I(S3209).

In more detail, the second light emitting layer 340 is formed on thesecond electrodes 331, 332 and 333. The second light emitting layer 340can be formed by a deposition process or a solution process. If thesecond light emitting layer 340 is formed by the deposition process, thesecond light emitting layer 340 can be formed using an evaporationmethod.

The second light emitting layer 340 is connected among the firstsubpixel P1, the second subpixel P2 and the third subpixel P3. Thesecond light emitting layer 340 can be formed to partially fill thespace between the mask patterns 281, 282 and 283 and the secondelectrodes 331, 332 and 333. At this time, an air gap AG can be formedin a space where the second light emitting layer 340 is not filledbetween the mask patterns 281, 282 and 283 and the second electrodes331, 332 and 333.

The second light emitting layer 340 can be any one of, but not limitedto, a red light emitting layer for emitting red light, a green lightemitting layer for emitting green light, a blue light emitting layer foremitting blue light, and a yellow light emitting layer for emittingyellow light.

However, the second light emitting layer 340 can emit light of a colordifferent from that of the first light emitting layers 321, 322 and 323.If the first light emitting layers 321, 322 and 323 are light emittinglayers for emitting light of a first color, the second light emittinglayer 340 can be a light emitting layer for emitting light of a secondcolor different from the first color. For example, the first lightemitting layers 321, 322 and 323 can be yellow light emitting layers foremitting yellow light, and the second light emitting layer 340 can be ablue light emitting layer for emitting blue light.

Next, the third electrode 350 is formed as shown in FIG. 33J (S3210).

In more detail, the third electrode 350 is formed on the second lightemitting layer 340. The third electrode 350 can be formed by a physicsvapor deposition such as sputtering. Alternatively, the third electrode350 can be formed by evaporation.

The third electrode 350 can be formed of a transparent metal material, asemi-transmissive metal material, or a metal material with highreflexibility. If the display device 100 is formed in a bottom emissiontype, the third electrode 350 can be formed of a metal material withhigh reflexibility such as a deposited structure (Ti/Al/Ti) of Al andTi, a deposited structure (ITO/Al/ITO) of Al and ITO, an Ag alloy, and adeposited structure (ITO/Ag alloy/ITO) of Ag alloy and ITO. The Ag alloycan be an alloy of Ag, Pd and Cu. If the display device 100 is formed ina top emission type, the third electrode 350 can be formed of atransparent conductive material (TCO) such as ITO and IZO, which cantransmit light, or a semi-transmissive conductive material such as Mg,Ag, or an alloy of Mg and Ag. The third electrode 350 can be a cathodeelectrode.

FIGS. 34A to 34C are views illustrating a display device according toanother embodiment of the present disclosure, and relate to ahead-mounted display (HMD) device. FIG. 34A is brief perspective view,FIG. 34B is a brief plane view of a virtual reality (VR) structure, andFIG. 34C is a brief cross-sectional view of an augmented reality (AR)structure. All the components of the HMD device and the VR structureaccording to all embodiments of the present disclosure are operativelycoupled and configured.

Referring to FIG. 34A, a head mounted display device according to thepresent disclosure comprises a storage case 10, and a head mounted band30.

The storage case 10 stores the display device, a lens array and anocular lens therein.

The head mounted band 30 is fixed to the storage case 10. The headmounted band 30 is formed to surround a top surface and both sides of auser's head, but is not limited to this example. The head mounted band30 is to fix a head mounted display to a user's head and can be replacedwith a structure formed in a shape of a glasses frame or a helmet shape.

Referring to FIG. 34B, a head mounted display device of a virtualreality (VR) structure according to the present disclosure includes aleft eye display device 12, a right eye display device 11, a lens array13, a left eye ocular lens 20 a, and a right eye ocular lens 20 b.

The left eye display device 12, the right eye display device 11, thelens array 13, the left eye ocular lens 20 a, and the right eye ocularlens 20 b are stored in the aforementioned storage case 10.

The left eye display device 12 and the right eye display device 11 candisplay the same image, and in this case, a user can view 2D image.Alternatively, the left eye display device 12 can display a left eyeimage and the right eye display device 11 can display a right eye image,and in this case, a user can view a 3D image. Each of the left eyedisplay device 12 and the right eye display device 11 can be comprisedof a display device according to FIGS. 1 to 29 described above. At thistime, a top portion corresponding to a surface where an image isdisplayed in FIGS. 1 to 29, for example, a color filter layer faces thelens array 13.

The lens array 13 can be provided between the left eye ocular lens 20 aand the left eye display device 12 by being spaced apart from each ofthe left eye ocular lens 20 a and the left eye display device 12. Thatis, the lens array 13 can be arranged in front of the left eye ocularlens 20 a and behind the left eye display device 12. Also, the lensarray 13 can be provided between the right eye ocular lens 20 b and theright eye display device 11 by being spaced apparat from each of theright eye ocular lens 20 b and the right eye display device 11. That is,the lens array 13 can be arranged in front of the right eye ocular lens20 b and behind the right eye display device 11.

The lens array 13 can be a micro lens array. The lens array 13 can bereplaced with a pin hole array. Due to the lens array 13, imagesdisplayed on the left eye display device 12 or the right eye displaydevice 11 can be viewed to be magnified to a user.

A left eye LE of a user can be arranged in the left eye ocular lens 20a, and a right eye RE of a user can be arranged in the right eye ocularlens 20 b.

Referring to FIG. 34C, a head mounted display device of an AR structureaccording to the present disclosure includes a left eye display device12, a lens array 13, a left eye ocular lens 20 a, a transmissivereflection portion 14, and a transmissive window 15. Although only astructure for a left eye is shown in FIG. 34c for convenience, astructure for a right eye is the same as the structure for the left eye.

The left eye display device 12, the lens array 13, the left eye ocularlens 20 a, the transmissive reflection portion 14, and the transmissivewindow 15 are stored in the aforementioned storage case 10.

The left eye display device 12 can be arranged at one side of thetransmissive reflection portion 14, for example, at an upper side,without covering the transmissive window 15. Therefore, the left eyedisplay device 12 can provide the transmissive reflection portion 14with an image without covering an outer background viewed through thetransmissive window 15.

The left eye display device 12 can be comprised of the display deviceaccording to FIGS. 1 to 29 described above. In this case, the topportion corresponding to the surface where an image is displayed inFIGS. 1 to 29, for example, a color filter faces the transmissivereflection portion 14.

The lens array 13 can be provided between the left eye ocular lens 20 aand the transmissive reflection portion 14.

A left eye of a user is arranged in the left eye ocular lens 20 a.

The transmissive reflection portion 14 is arranged between the lensarray 13 and the transmissive window 15. The transmissive reflectionportion 14 can include a reflective surface 14 a which transmits aportion of light and reflects the other portion of light. The reflectivesurface 14 a is formed to allow an image displayed on the left eyedisplay device 12 to proceed to the lens array 13. Therefore, the usercan view all of images displayed on the left eye display device 12 andan outer background through the transmissive window 15. That is, sincethe user can view one image by overlapping background in reality withvirtual images, augmented reality (AR) can be embodied.

The transmissive window 15 is arranged in front of the transmissivereflection portion 14.

It will be apparent to those skilled in the art that the presentdisclosure described above is not limited by the above-describedembodiments and the accompanying drawings and that varioussubstitutions, modifications, and variations can be made in the presentdisclosure without departing from the spirit or scope of thedisclosures. Consequently, the scope of the present disclosure isdefined by the accompanying claims, and it is intended that allvariations or modifications derived from the meaning, scope, andequivalent concept of the claims fall within the scope of the presentdisclosure.

What is claimed is:
 1. A display device comprising: a substrateincluding a first subpixel and a second subpixel; a first electrode onthe substrate; a first light emitting layer on the first electrode, andconfigured to emit light of a first color; a second electrode on thefirst light emitting layer, wherein the second electrode is disconnectedbetween the first subpixel and the second subpixel; a second lightemitting layer on the second electrode, and configured to emit light ofa second color; a third electrode on the second light emitting layer,wherein the third electrode is electrically connected with the secondelectrode of the first subpixel; and a first connection electrode forelectrically connecting the second electrode of the first subpixel withthe third electrode of the first subpixel, wherein the first connectionelectrode includes: a first power line connected to the second electrodeof the first subpixel; and an auxiliary power line connected to each ofthe first power line and the third electrode of the first subpixel. 2.The display device of claim 1, wherein the first subpixel allows thefirst light emitting layer to emit light, and the second subpixel allowsthe second light emitting layer to emit light.
 3. The display device ofclaim 2, wherein the second light emitting layer emits light of a bluecolor.
 4. The display device of claim 1, wherein the first lightemitting layer is disconnected between the first subpixel and the secondsubpixel.
 5. The display device of claim 1, wherein the second lightemitting layer is connected between the first subpixel and the secondsubpixel.
 6. The display device of claim 1, wherein the third electrodeis connected between the first subpixel and the second subpixel.
 7. Thedisplay device of claim 1, wherein the substrate includes a display areain which the first subpixel and the second subpixel are arranged and anon-display area surrounding the display area, the auxiliary power lineis arranged in the non-display area, and the first power line isarranged in the display area and connected with the second electrode ofthe first subpixel, and is extended from the display area to theauxiliary power line arranged in the non-display area and thus its oneend is connected to the auxiliary power line.
 8. The display device ofclaim 1, further comprising a driving transistor provided in at leastone of the first subpixel and the second subpixel, the drivingtransistor including an active layer, a gate electrode, a sourceelectrode and a drain electrode, wherein the first power line is spacedapart from one of the active layer, the gate electrode, the sourceelectrode and the drain electrode on the same layer as any one of them.9. The display device of claim 8, further comprising a first insulatingfilm provided on the driving transistor and the first power line andprovided with a first opening area for partially exposing the firstpower line, wherein the second electrode of the first subpixel isconnected to the first power line in the first opening area.
 10. Thedisplay device of claim 9, further comprising a first mask patternprovided on the first insulating film and provided with a protrusionprotruded to partially cover the first opening area.
 11. The displaydevice of claim 10, wherein the first mask pattern is formed of the samematerial as that of the first electrode simultaneously with the firstelectrode.
 12. The display device of claim 10, wherein the first maskpattern is spaced apart from the first electrode.
 13. The display deviceof claim 10, wherein the first mask pattern is formed in the displayarea along the first power line.
 14. The display device of claim 10,wherein the second electrode of the first subpixel is connected to thefirst power line below the first mask pattern.
 15. The display device ofclaim 1, wherein the first electrode is provided in each of the firstsubpixel and the second subpixel, and the second electrode of the secondsubpixel is electrically connected with the first electrode.
 16. Thedisplay device of claim 1, further comprising a second connectionelectrode for electrically connecting the first electrode of the secondsubpixel with the second electrode of the second subpixel.
 17. Thedisplay device of claim 16, wherein the second connection electrode isprovided between the first subpixel and the second subpixel.
 18. Thedisplay device of claim 17, further comprising a first insulating filmprovided on the second connection electrode and provided with a secondopening area for partially exposing the second connection electrode,wherein the second electrode of the second subpixel is connected withthe second connection electrode in the second opening area, and thefirst electrode of the second subpixel is connected to the secondconnection electrode through a contact hole that passes through thefirst insulating film.
 19. The display device of claim 18, furthercomprising a second mask pattern provided on the first insulating filmand provided with a protrusion protruded to partially cover the secondopening area, wherein the second electrode of the second subpixel isconnected to the second connection electrode below the second maskpattern.
 20. The display device of claim 19, wherein the second maskpattern is formed of a same material as that of the first electrodesimultaneously with the first electrode.
 21. The display device of claim19, wherein the second mask pattern is spaced apart from the firstelectrode.
 22. The display device of claim 19, wherein the second maskpattern is formed to surround the second subpixel.
 23. The displaydevice of claim 1, wherein the first electrode is formed in only thefirst subpixel among the first and second subpixels.
 24. The displaydevice of claim 23, further comprising: a first driving transistorprovided in the first subpixel on the substrate; and a second drivingtransistor provided in the second subpixel on the substrate, wherein thefirst electrode provided in the first subpixel is connected to the firstdriving transistor and thus supplied with a first voltage, and thesecond electrode provided in the second subpixel is connected to thesecond driving transistor and thus supplied with a second voltage. 25.The display device of claim 23, further comprising a bank provided inonly the first subpixel among the first and second subpixels andpatterned to cover ends of the first electrode.
 26. The display deviceof claim 23, further comprising a third connection electrodeelectrically connected with the second electrode of the second subpixel.27. The display device of claim 26, wherein the third connectionelectrode is provided between the first subpixel and the secondsubpixel.
 28. The display device of claim 26, further comprising a firstinsulating film provided on the third connection electrode and providedwith a third opening area for partially exposing the third connectionelectrode, wherein the second electrode of the second subpixel isconnected with the third connection electrode in the third opening area.29. The display device of claim 28, further comprising a third maskpattern provided on the first insulating film and provided with aprotrusion protruded to partially cover the third opening area, whereinthe second electrode of the second subpixel is connected to the secondconnection electrode below the third mask pattern.
 30. The displaydevice of claim 29, wherein the third mask pattern is formed of a samematerial as that of the first electrode simultaneously with the firstelectrode.
 31. The display device of claim 29, wherein the third maskpattern is formed to surround the second subpixel.
 32. The displaydevice of claim 26, wherein the first subpixel and the second subpixelhave their respective light emitting areas different from each other.33. The display device of claim 26, wherein the second subpixel has alight emitting area greater than that of the first subpixel.